Magnetic memory devices including magnetic layers separated by tunnel barriers

ABSTRACT

A magnetic memory device may include a first vertical magnetic layer, a non-magnetic layer on the first vertical magnetic layer, and a first junction magnetic layer on the non-magnetic layer, with the non-magnetic layer being between the first vertical magnetic layer and the first junction magnetic layer. A tunnel barrier may be on the first junction magnetic layer, with the first junction magnetic layer being between the non-magnetic layer and the tunnel barrier. A second junction magnetic layer may be on the tunnel barrier with the tunnel barrier being between the first and second junction magnetic layers, and a second vertical magnetic layer may be on the second junction magnetic layer with the second junction magnetic layer being between the tunnel barrier and the second vertical magnetic layer.

CROSS-REFERENCE TO RELATED APPLICATIONS

This U.S. non-provisional patent application claims the benefit ofpriority under 35 U.S.C. §119 of Korean Patent Application No.10-2009-0093306, filed on Sep. 30, 2009 and Korean Application No.10-2009-0086084, filed on Sep. 11, 2009, the disclosures of which arehereby incorporated hereby in their entireties by reference.

BACKGROUND

The present disclosure herein relates to memory devices, and moreparticularly, to a magnetic memory devices.

As high speed operation and low power consumption of electronic devicesare realized, memory devices may also require rapid read/writeperformance, and low operating voltages. Magnetic memory devices arebeing studied as memory devices to provide increased speed and reducedoperating voltages. Because magnetic memory devices may provide highspeed operation and/or non-volatile characteristics, they have drawnattention for the next generation of memories.

Commonly known magnetic memory devices may include a magnetic tunneljunction pattern (MTJ). The magnetic tunnel junction pattern is formedby two magnetic substances and an insulation layer interposedtherebetween, and the resistance value of the magnetic tunnel junctionpattern may be varied according to the magnetization directions of thetwo magnetic substances. Specifically, when the magnetization directionsof the two magnetic substances are anti-parallel to each other, themagnetic tunnel junction pattern may have a high resistance value. Whenthe magnetization directions of the two magnetic substances are parallelto each other, the magnetic tunnel junction pattern may have a lowresistance value. The difference between these resistance values may beused to write/read data.

SUMMARY

According to some embodiments of the inventive concept, a magneticmemory device may provide enhanced reliability, a high magnetoresistanceratio and/or reduced operating power.

In some embodiments, a magnetic memory device may include a tunnelbarrier on a substrate, first and second junction magnetic layers, and anon-magnetic layer. The first junction magnetic layer may contact oneface of the tunnel barrier. A first vertical magnetic layer may beseparated from the tunnel barrier by the first junction magnetic layer.The second junction magnetic layer may contact the other face of thetunnel barrier, and a second vertical magnetic layer may be separatedfrom the tunnel barrier by the second junction magnetic layer. Thenon-magnetic layer may be between the first junction magnetic layer andthe first vertical magnetic layer.

In other embodiments, the magnetization directions of the first verticalmagnetic layer and the second vertical magnetic layer may be vertical tothe plane of the substrate when the magnetic memory device operates.

In still other embodiments, another non-magnetic layer may be interposedbetween the second junction magnetic layer and the second verticalmagnetic layer.

In even other embodiments, the first junction magnetic layer and/or thesecond junction magnetic layer may have a first crystal structure, whilethe first vertical magnetic layer and/or the second vertical magneticlayer may have a second crystal structure different from the firstcrystal structure.

In yet other embodiments, the crystal plane of the tunnel barrier at theinterface between the tunnel barrier and the first junction may beidentical to the crystal plane of the first junction magnetic layer atthe interface. The first crystal structure may be a NaCl-type crystalstructure or a BCC crystal structure, and the crystal planes may be a(001) crystal plane.

In further embodiments, the second crystal structure may be an L10crystal structure, a FCC crystal structure, or a hexagonal close-packing(HCP) lattice.

In still further embodiments, the first vertical magnetic layer and/orthe second vertical magnetic layer may include a RE-TM (RareEarth-Transition Metal) alloy.

In even further embodiments, the first vertical magnetic layer and/orthe second magnetic layer may include non-magnetic metal layers andferromagnetic metal layers alternately stacked multiple times, and theferromagnetic metal layers may have a thickness of one to several atoms.

In yet further embodiments, the first junction magnetic layer and/or thesecond junction magnetic layer may include an alloy magnetic materialincluding at least one selected from the group consisting of cobalt(Co), iron (Fe), and nickel (Ni), and the alloy magnetic substance mayfurther include a non-magnetic element.

In some embodiments, the non-magnetic layer may have a thickness in arange of about 2 Å (Angstroms) to about 20 Å (Angstroms).

In other embodiments, the non-magnetic layer may include at least oneselected from non-magnetic metals. The non-magnetic metal may be atleast one selected from non-magnetic transition metals.

In still other embodiments, the first vertical magnetic layer and thefirst junction magnetic layer may be exchange-coupled with each other bythe non-magnetic layer.

In yet other embodiments, the non-magnetic layer may further include ametal compound layer contacting the top face and/or bottom face of thenon-magnetic layer, and the metal compound layer may include at leastone selected from the group consisting of metal oxide, metal nitride,and metal oxynitrides.

In even other embodiments of the inventive concept, magnetic memorydevices may include a tunnel barrier on a substrate, a free magneticlayer contacting one face of the tunnel barrier and having a planeparallel to the plane of the substrate, and a reference magnetic layercontacting the other face of the tunnel barrier and having a planeparallel to the plane of the substrate. The free magnetic layer and thereference magnetic layer may include iron (Fe), and the iron content ofthe free magnetic layer may be equal to or more than that of thereference magnetic layer.

In some embodiments, the iron (Fe) content of the free magnetic layermay be in a range of about 40% to about 60% by atomic percent.

In other embodiments, the free magnetic layer and/or the referencemagnetic layer may further include at least one selected from Co and Ni.

In still other embodiments, the free magnetic layer and/or the referencemagnetic layer may further include a non-magnetic element.

In even other embodiments, the free magnetic layer and the referencemagnetic layer may have magnetization directions vertical(perpendicular) to the plane/surface of the substrate when the magneticmemory device operates.

In yet other embodiments, the free magnetic layer and the referencemagnetic layer may have magnetization directions parallel to theplane/surface of the substrate when the magnetic memory device operates.

In still other embodiments of the inventive concept, magnetic memorydevices may include a substrate. A first magnetic substance, a tunnelbarrier, and a second magnetic substance may be sequentially stacked onthe substrate. The first magnetic substance may include a first verticalmagnetic layer which is adjacent to the substrate and has a hexagonalclose-packing (HCP) lattice structure.

In some embodiments, the c-axis of the hexagonal close-packing latticemay be substantially vertical to the plane of the substrate.

In other embodiments, the c-axis may be an axis at which the firstvertical magnetic layer may be easily magnetized.

In still other embodiments, the magnetic memory device may furtherinclude a seed layer including the HCP lattice between the substrate andthe first vertical magnetic layer.

In even other embodiments, the second magnetic substrate may furtherinclude a second vertical magnetic layer having a hexagonalclose-packing lattice structure.

In yet other embodiments, the first magnetic substance may include afirst magnetic junction layer which is adjacent to the tunnel barrier onthe first vertical magnetic layer and the second magnetic substance mayinclude an second magnetic junction layer which is adjacent to thetunnel barrier under the second vertical magnetic layer.

In further embodiments, the second magnetic junction layer and the firstmagnetic junction layer may include a soft magnetic material.

In still further embodiments, the magnetic memory device may furtherinclude an exchange coupling control layer between the first verticalmagnetic layer and the first magnetic junction layer and/or between thesecond vertical magnetic layer and the second magnetic junction layer.

In even further embodiments, the exchange coupling control layer mayinclude at least one selected from metal elements including a transitionmetal element.

In yet further embodiments, the exchange coupling control layer mayfurther include an oxide layer formed by oxidation of the surface of theexchange coupling control layer.

In alternative embodiments, the second magnetic substance may furtherinclude non-magnetic layers and ferromagnetic layers alternately stackedmultiple times on the second vertical magnetic layer. The ferromagneticlayers may have an atomic layer thickness.

In still alternative embodiments, the first vertical magnetic layer mayinclude a disordered cobalt-platinum alloy having a platinum content ina range of about 10% to about 45% by atomic percent.

In even alternative embodiments, the first vertical magnetic layer mayinclude Co₃Pt.

In yet alternative embodiments, the first vertical magnetic layer mayfurther include at least one selected from the group consisting of boron(B), chromium (Cr), and copper (Cu).

In other alternative embodiments, the tunnel barrier may include atleast one selected from the group consisting of magnesium (Mg), titanium(Ti), aluminum (Al), an oxide of magnesium-zinc (MgZn) and/ormagnesium-boron (MgB), and/or a nitride of titanium (Ti) and/or vanadium(V).

In still other alternative embodiments, the magnetic memory device mayfurther include a capping layer on the second magnetic substance. Thecapping layer may include at least one selected from the groupconsisting of tantalum (Ta), aluminum (Al), copper (Cu), gold (Au),silver (Ag), titanium (Ti), tantalum nitride (TaN), and/or titaniumnitride (TiN).

In even other alternative embodiments, the current may flow in adirection substantially vertical to the plane of the substrate when themagnetic memory device operates.

In yet other alternative embodiments, the magnetization directions ofthe second magnetic layer and the first magnetic layer may besubstantially vertical to the plane of the substrate.

According to some embodiments, a magnetic memory device may include afirst vertical magnetic layer, a non-magnetic layer on the firstvertical magnetic layer, and a first junction magnetic layer on thenon-magnetic layer with the non-magnetic layer being between the firstvertical magnetic layer and the first junction magnetic layer. A tunnelbarrier may be on the first junction magnetic layer with the firstjunction magnetic layer being between the non-magnetic layer and thetunnel barrier. A second junction magnetic layer may be on the tunnelbarrier with the tunnel barrier being between the first and secondjunction magnetic layers. A second vertical magnetic layer may be on thesecond junction magnetic layer with the second junction magnetic layerbeing between the tunnel barrier and the second vertical magnetic layer.

According to some other embodiments, a magnetic memory device mayinclude a free magnetic layer comprising iron (Fe), a tunnel barrier onthe free magnetic layer, and a reference magnetic layer comprising iron(Fe) on the tunnel barrier. The tunnel barrier may be between the freemagnetic layer and the reference magnetic layer. A concentration of ironin the free magnetic layer may be at least as great as a concentrationof iron in the reference magnetic layer.

According to still other embodiments, a magnetic memory device mayinclude a substrate, a first magnetic substance on the substrate, atunnel barrier on the first magnetic substance, and a second magneticsubstance on the tunnel barrier. The first magnetic substance mayinclude a vertical magnetic layer having a hexagonal close-packing (HCP)lattice structure adjacent the substrate. The magnetic substance may bebetween the substrate and the tunnel barrier, and the tunnel barrier maybe between the first and second magnetic substances.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings are included to provide a furtherunderstanding of inventive concepts, and are incorporated in andconstitute a part of this specification. The drawings illustrateexemplary embodiments of inventive concepts and, together with thedescription, serve to explain principles of inventive concepts. In thedrawings:

FIG. 1 is a view illustrating a magnetic memory device according tofirst embodiments of the inventive concepts;

FIG. 2 is a view illustrating a modified example of a magnetic memorydevice according to first embodiments of the inventive concepts;

FIG. 3 is a view illustrating another modified example of a magneticmemory device according to first embodiments of inventive concepts;

FIGS. 4A through 4C are views describing a method for a magnetic memorydevice according to first embodiments of inventive concepts;

FIG. 5 is a view illustrating a magnetic memory device according tosecond embodiments of inventive concepts;

FIG. 6 is a view illustrating a modified example of a magnetic memorydevice according to second embodiments of the inventive concepts;

FIG. 7 is a view illustrating a magnetic memory device according tothird embodiments of inventive concepts;

FIG. 8 is a view describing a method for a magnetic memory deviceaccording to third embodiments of inventive concepts;

FIG. 9 is a view describing a crystal structure according to thirdembodiments of inventive concepts; and

FIG. 10 is a view illustrating a magnetic memory device according to thefourth embodiments of the inventive concepts.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Magnetic memory devices and methods for forming the same according toembodiments of inventive concepts will be described below in more detailwith reference to the accompanying drawings. Embodiments to be describedare provided such that the spirit of inventive concepts is easilyunderstood by those skilled in the art, and inventive concepts shouldnot be construed as limited thereby. Embodiments of inventive conceptsmay be embodied in different forms within the technical spirit and scopeof inventive concepts. In the drawings, the thicknesses and relativethicknesses of elements may be exaggerated to clearly illustrateembodiments of inventive concepts. Terms related to positions, such asupper and lower in the specification, are relative expressions toclarify the description and should not be construed as limited topositions between absolute elements.

Advantages and features of inventive concepts and methods ofaccomplishing the same may be understood more readily by reference tothe following detailed description of embodiments and the accompanyingdrawings. Inventive concepts may, however, be embodied in many differentforms and should not be construed as being limited to embodiments setforth herein. Rather, these embodiments are provided so that thisdisclosure will be thorough and complete and will fully convey inventiveconcepts to those skilled in the art, and inventive concepts will onlybe defined by the appended claims Like reference numerals refer to likeelements throughout the specification.

It will be understood that when an element is referred to as being “on”,“connected to”, or “coupled to” another element, it can be directly on,directly connected to, or directly coupled to the other element orintervening elements may be present. In contrast, when an element isreferred to as being “directly on”, “directly connected to”, or“directly coupled to” another element, there are no intervening elementspresent. As used herein, the term “and/or” includes any and allcombinations of one or more of the associated listed items.

It will be understood that, although the terms first, second, etc. maybe used herein to describe various elements, components, layers, and/orsections, these elements, components, layers, and/or sections should notbe limited by these terms. These terms are only used to distinguish oneelement, component or section from another element, component, orsection. Thus, a first element, component, layer, or section discussedbelow could be termed a second element, component, layer, or sectionwithout departing from the teachings of inventive concepts.

Unless otherwise defined, all terms (including technical and scientificterms) used herein have the same meaning as commonly understood by oneof ordinary skill in the art to which inventive concepts belong. It willbe further understood that terms, such as those defined in commonly useddictionaries, should be interpreted as having a meaning that isconsistent with their meaning in the context of the relevant art andwill not be interpreted in an idealized or overly formal sense unlessexpressly so defined herein.

In addition, when terms used in this specification are not specificallydefined, all the terms used in this specification (including technicaland scientific terms) can be understood by those skilled in the art.Further, when general terms defined in the dictionaries are notspecifically defined, the terms will have the normal meaning in the art.

Relative terms such as “below” or “above” or “upper” or “lower” or“horizontal” or “lateral” or “vertical” may be used herein to describe arelationship of one element, layer or region to another element, layeror region as illustrated in the figures. It will be understood thatthese terms are intended to encompass different orientations of thedevice in addition to the orientation depicted in the figures.

The terminology used herein is for the purpose of describing particularembodiments only and is not intended to be limiting of exampleembodiments. As used herein, the singular forms “a,” “an” and “the” areintended to include the plural forms as well, unless the context clearlyindicates otherwise. It will be further understood that the terms“comprises” and/or “comprising,” when used in this specification,specify the presence of stated features, integers, steps, operations,elements, layers, and/or components, but do not preclude the presence oraddition of one or more other features, integers, steps, operations,elements, layers, components, and/or groups thereof.

In the drawings, the illustrated features may be changed due to, forexample, the manufacturing technology and/or tolerance. Accordingly, itshould be understood that example embodiments of inventive concepts arenot limited to the drawings but include modifications of the features ofelements caused due to, for example, manufacturing tolerances.

(A First Embodiment and Modified Examples Thereof)

Referring to FIG. 1, a magnetic memory device according to firstembodiments of inventive concepts will be described. A lower electrode110 is disposed on a substrate 100. The substrate 100 may be asemiconductor-based semiconductor substrate. The substrate 100 mayinclude a conductive region and/or an insulating region. The lowerelectrode 110 may be electrically connected to the conductive region ofthe substrate 100. The lower electrode 110 may be disposed on thesubstrate 100 and/or in the substrate 100. The lower electrode 110, forexample, may have any one shape selected from the group consisting ofline, island, and/or plate.

A first vertical magnetic layer 123 may be disposed on the lowerelectrode 110. In an embodiment, the first vertical magnetic layer 123may include non-magnetic layers 121 and ferromagnetic layers 122, whichare alternately stacked. The ferromagnetic layers 122 may include atleast one selected from the group consisting of iron (Fe), cobalt (Co),and/or nickel (Ni), and the non-magnetic layers 121 may include at leastone selected from the group consisting of chromium (Cr), platinum (Pt),palladium (Pd), iridium (Ir), ruthenium (Ru), rhodium (Rh), osmium (Os),rhenium (Re), gold (Au), and/or copper (Cu). For example, the firstvertical magnetic layer 123 may be [Co/Pt]m, [Co/Pd]m, [Ni/Pt]m (m is astacking number of each layer and a natural number of 2 or more), or acombination thereof. In an embodiment, the non-magnetic layers 121 andferromagnetic layers 122 may be stacked in a range of about 2 to about20 times, respectively. When the current flows in a direction vertical(perpendicular) to the substrate 100 and the planes of the firstvertical magnetic layers 123, the first vertical magnetic layer 123 maybe configured such that it has a magnetization direction parallel to thecurrent. For this configuration, the ferromagnetic layers 122 may bethinly formed to have a thickness of one to several atomic layers.

A first non-magnetic layer 130 may be disposed on the first verticalmagnetic layer 123. The first non-magnetic layer 130 may have arelatively thin thickness. For example, the first non-magnetic layer 130may be formed to have a thickness in a range of about 2 Å (Angstroms) toabout 20 Å (Angstroms). The first non-magnetic layer 130 may not have atexture. For example, the first non-magnetic layer 130 may be uniformlyformed on the first vertical magnetic layer 123 and may not have atexture by the thin thickness.

The first non-magnetic layer 130 may include at least one selected fromnon-magnetic metal elements including a non-magnetic transition metal.For example, the first non-magnetic layer 130 may include at least oneselected from the group consisting of magnesium (Mg), aluminum (Al),titanium (Ti), chromium (Cr), ruthenium (Ru), copper (Cu), zinc (Zn),tantalum (Ta), gold (Au), silver (Ag), palladium (Pd), rhodium (Rh),iridium (Ir), molybdenum (Mo), vanadium (V), tungsten (W), niobdenum(Nb), zirconium (Zr), yttrium (Y), and/or hafnium (Hf).

In an embodiment, the first non-magnetic layer may be formed with aplurality of layers. For example, the first non-magnetic layer 130 mayinclude a first lower metal compound layer 133, a first non-magneticmetal layer 136, and a first upper metal compound layer 139, which aresequentially stacked on the vertical magnetic layer 123. While not shownin FIG. 1, the first non-magnetic layer 130 may include a metal compoundlayer/non-magnetic metal layer and/or a non-magnetic metal layer/metalcompound layer, which are sequentially stacked on the vertical magneticlayer 123. The first non-magnetic metal layer 136 may include at leastone selected from the group consisting of magnesium (Mg), aluminum (Al),titanium (Ti), chromium (Cr), ruthenium (Ru), copper (Cu), zinc (Zn),tantalum (Ta), gold (Au), silver (Ag), palladium (Pd), rhodium (Rh),iridium (Ir), molybdenum (Mo), vanadium (V), tungsten (W), niobdenum(Nb), zirconium (Zr), yttrium (Y), and/or hafnium (Hf). The first lowerand upper metal compound layers 133, 139 may be a metal oxide, a metalnitride, a metal oxynitride, and/or a combination thereof. For example,each metal compound layer may be formed of a compound of the metallayer. Conversely, the first non-magnetic layer 130 may include only asingle metal layer or a plurality of metal layers. The diffusion ofmetal atoms in the first non-magnetic metal layer 136 into anotheradjacent layer may be prevented and/or reduced by the first lower andupper metal compound layers 133, 139.

A first junction magnetic layer 141 may be disposed on the firstnon-magnetic layer 130. The first junction magnetic layer 141 mayinclude a soft magnetic material. The first junction magnetic layer 141may have a low damping constant and a high spin polarization ratio. Forexample, the first junction metal layer 141 may include at least oneselected from the group consisting of cobalt (Co), iron (Fe), and/ornickel (Ni). The first junction magnetic layer 141 may further includeat least one selected from non-magnetic materials including boron (B),zinc (Zn), aluminum (Al), titanium (Ti), ruthenium (Ru), tantalum (Ta),silicon (Si), silver (Ag), gold (Au), copper (Cu), carbon (C), and/ornitrogen (N). Specifically, the first junction magnetic layer 141 mayinclude CoFe and/or NiFe, and may further include boron (B).Furthermore, in order to decrease a saturation magnetization of thefirst junction magnetic layer 141, the first junction magnetic layer 141may further include at least one selected from the group consisting oftitanium (Ti), aluminum (Al), silicon (Si), magnesium (Mg), tantalum(Ta), and/or silicon (Si).

The first non-magnetic layer 130 between the first junction magneticlayer 141 and the first vertical magnetic layer 123 may enhance thevertical magnetic anisotropy of a magnetic memory cell including them.For example, the first junction magnetic layer 141 may beantiferromagnetically or ferromagnetically exchange coupled with thefirst vertical magnetic layer 123 by the first non-magnetic layer 130.Because the first vertical magnetic layer 123 has a high verticalmagnetic anisotropy, the vertical magnetic anisotropy of the firstjunction magnetic layer 141 exchange-coupled with the first verticalmagnetic layer 123 may be also enhanced. The vertical magneticanisotropy in the specification is defined as a property of the layer tobe magnetized in the direction vertical to the plane of the substrate100. As used herein, the term vertical may refer to a direction that isperpendicular with respect to a surface of substrate 100.

The crystal structure of the first junction magnetic layer 141 may havea structure different from that of the first vertical magnetic layer 123due to the first non-magnetic layer 130. Accordingly, themagnetoresistance ratio of a magnetic tunnel junction may be furtherenhanced. A detailed description on this is provided with respect tomethods for forming a first junction metal layer 141 to be subsequentlydescribed.

A tunnel barrier 145 may be disposed on the first junction metal layer141. The tunnel barrier 145 may have a thickness thinner than the spindiffusion distance. The tunnel barrier 145 may include a non-magneticmaterial. In an embodiment, the tunnel barrier 145 may be formed of aninsulating material layer. Conversely, the tunnel barrier 145 mayinclude a plurality of layers. For example, the tunnel barrier 145 mayinclude at least one selected from the group consisting of magnesium(Mg), titanium (Ti), aluminum (Al), an oxide of magnesium-zinc (MgZn)and/or magnesium-boron (MgB), and/or a nitride of titanium (Ti) and/orvanadium (V). For example, the tunnel barrier may be formed of amagnesium oxide (MgO) layer.

The tunnel barrier 145 may have a crystal structure similar to that ofthe first junction magnetic layer 141. For example, the first junctionmagnetic layer 141 may include a magnetic material having abody-centered cubic (BCC) structure or a magnetic material with abody-centered cubic structure, including a non-magnetic element. Whenthe first junction magnetic layer 141 includes a non-magnetic element,the magnetic material may become amorphous. The tunnel barrier 145 andthe first junction magnetic layer 141 may have a NaCl-type crystalstructure and a body-centered cubic structure, respectively, and the(001) crystal plane of the tunnel barrier 145 may be contacted with the(001) crystal plane of the first junction magnetic layer 141 to form aninterface. The magnetoresistance ratio of a magnetic tunnel junctionincluding the tunnel barrier 145 and the first junction magnetic layer141 may be thereby enhanced.

A second junction magnetic layer 149 may be disposed on the tunnelbarrier 145. The second junction magnetic layer 149 may include a softmagnetic material. For example, the second junction magnetic layer 149may include cobalt (Co), iron (Fe), and/or nickel (Ni) atoms such thatthe contents of the atoms may be determined to reduce the saturationmagnetization of the second junction magnetic layer 149. The secondjunction magnetic layer 149 may have a low damping constant and a highspin polarization ratio. In order to achieve these, the second junctionmagnetic layer 149 may further include at least one selected fromnon-magnetic materials including boron (B), zinc (Zn), aluminum (Al),titanium (Ti), ruthenium (Ru), tantalum (Ta), silicon (Si), silver (Ag),gold (Au), copper (Cu), carbon (C), and/or nitrogen (N). For example,the second junction magnetic layer 149 may include CoFe and/or NiFe, andmay further include boron. Furthermore, the second junction magneticlayer 149 may further include at least one selected from non-magneticelements including titanium (Ti), aluminum (Al), silicon (Si), magnesium(Mg), and/or tantalum (Ta). The content of the selected non-magneticelement in the second junction magnetic layer 149 may be in a range ofabout 1% to about 15% by atomic percent. When the second junctionmagnetic layer 149 is used as a free layer of a magnetic memory cell,the saturation magnetization of the second junction magnetic layer 149may be controlled to a value less than that of the first junctionmagnetic layer 141.

The second junction magnetic layer 149 may have a crystal structuresimilar to that of the tunnel barrier 145. For example, the tunnelbarrier 145 and the second junction magnetic layer 149 may have aNaCl-type crystal structure and a body-centered cubic structure, and the(001) crystal plane of the tunnel barrier 145 may be contacted with the(001) crystal plane of the second junction magnetic layer 149 to form aninterface. The magnetoresistance ratio of a magnetic tunnel junctionincluding the second junction magnetic layer 149 and the tunnel barrier145 may be thereby enhanced.

In some embodiments, the content of ferromagnetic atoms in the secondjunction magnetic layer 149 may be different from that of ferromagneticatoms in the first junction magnetic layer 141. For example, the firstand second junction magnetic layers 141, 149 may include at least oneselected from cobalt (Co), nickel (Ni), and/or iron (Fe), while the iron(Fe) content in the second junction magnetic layer 149 may be equal toor more than that in the first junction magnetic layer 141. In thiscase, the second junction magnetic layer 149 may serve as a free layer.

A second non-magnetic layer 150 may be disposed on the second junctionmagnetic layer 149. The second non-magnetic layer 150 may be formed witha relatively thin thickness. For example, the second non-magnetic layer150 may be formed to have a thickness in a range of about 2 Å(Angstroms) to about 20 Å (Angstroms). The second non-magnetic layer 150may not have a texture. For example, the second non-magnetic layer 150may be uniformly formed on the second junction magnetic layer 149 andmay not have a texture by the thin thickness.

The second non-magnetic layer 150 may include at least one selected fromnon-magnetic metal elements including a non-magnetic transition metal.For example, the second non-magnetic layer 150 may include at least oneselected from the group consisting of magnesium (Mg), aluminum (Al),titanium (Ti), chromium (Cr), ruthenium (Ru), copper (Cu), zinc (Zn),tantalum (Ta), gold (Au), silver (Ag), palladium (Pd), rhodium (Rh),iridium (Ir), molybdenum (Mo), vanadium (V), tungsten (W), niobdenum(Nb), zirconium (Zr), yttrium (Y), and/or hafnium (Hf).

In some embodiments, the second non-magnetic layer 150 is formed with aplurality of layers. For example, the second non-magnetic layer 150 mayinclude a second lower metal compound layer 153, a second non-magneticmetal layer 156, and a second upper metal compound layer 159, which aresequentially stacked on the second junction magnetic layer 149. Whilenot shown in FIG. 1, the second non-magnetic layer 150 may include ametal compound layer/non-magnetic metal layer or a non-magnetic metallayer/metal compound layer, which are sequentially stacked on the secondjunction magnetic layer 149. The second non-magnetic metal layer 156 mayinclude at least one selected from the group consisting of magnesium(Mg), aluminum (Al), titanium (Ti), chromium (Cr), ruthenium (Ru),copper (Cu), zinc (Zn), tantalum (Ta), gold (Au), silver (Ag), palladium(Pd), rhodium (Rh), iridium (Ir), molybdenum (Mo), vanadium (V),tungsten (W), niobdenum (Nb), zirconium (Zr), yttrium (Y), and/orhafnium (Hf). The second lower and upper metal compound layers 153, 159may be a metal oxide, a metal nitride, a metal oxynitride, or acombination thereof. For example, the second lower and upper metalcompound layers 153, 159 may be formed of a compound of the secondnon-magnetic metal layer 156. The diffusion of metal atoms in the secondnon-magnetic metal layer 156 into another adjacent layer may beprevented and/or reduced by the second lower and upper metal compoundlayers 153, 159. Conversely, the second non-magnetic layer 150 mayinclude only a single metal layer or a plurality of metal layers.

A second vertical magnetic layer 163 may be disposed on the secondnon-magnetic layer 150. In some embodiments, the second verticalmagnetic layer 163 may include non-magnetic layers 161 and ferromagneticlayers 162, alternately stacked. The ferromagnetic layers 162 mayinclude at least one selected from the group consisting of iron (Fe),cobalt (Co), and/or nickel (Ni), while the non-magnetic layers 161 mayinclude at least one selected from the group consisting of chromium(Cr), platinum (Pt), palladium (Pd), iridium (Ir), ruthenium (Ru),rhodium (Rh), osmium (Os), rhenium (Re), gold (Au), and/or copper (Cu).For example, the second vertical magnetic layer 163 may include[Co/Pt]n, [Co/Pd]n, [Ni/Pt]n (n is a stacking number of each layer and anatural number of 2 or more), or a combination thereof. Theferromagnetic layers 162 may be formed to have a thickness of one toseveral atoms. The exchange coupling between the second verticalmagnetic layer 163 and the second junction magnetic layer 149 may bereinforced by the second non-magnetic layer 150. The vertical magneticanisotropy of the second junction magnetic layer 149 may be therebyenhanced.

The stacking numbers n of non-magnetic layers 161 and ferromagneticlayers 162 in the second vertical magnetic layer 163 may be differentfrom those m of non-magnetic layers 121 and ferromagnetic layers 122 inthe first vertical magnetic layer 123. For example, the stacking numbersof non-magnetic layers 161 and ferromagnetic layers 162 in the secondvertical magnetic layer 163 may be smaller than those of non-magneticlayers 121 and ferromagnetic layers 122 in the first vertical magneticlayer 123. In this case, a first junction magnetic layer 141 adjacent tothe first vertical magnetic layer 123 may serve as a reference layer ofa magnetic memory cell, while a second junction magnetic layer 149adjacent to the second vertical magnetic layer 163 may serve as a freelayer of the magnetic memory cell. Conversely, the stacking numbers n ofnon-magnetic layers 161 and ferromagnetic layers 162 in the secondvertical magnetic layer 163 may be larger than those m of non-magneticlayers 121 and ferromagnetic layers 122 in the first vertical magneticlayer 123. In this case, the second junction magnetic layer 141 mayserve as a reference layer, while the first junction magnetic layer 149may serve as a free layer.

The first and second junction magnetic layers 141, 149 may havedifferent magnetic properties according to functions to be performed.For example, the junction magnetic layer serving as a free layer mayhave a saturation magnetization smaller than that of the junctionmagnetic layer serving as a reference layer. The saturationmagnetization may be controlled by the ratio of a ferromagnetic material(Co, Ni, and/or Fe) to be included and/or ratio of a non-magneticmaterial.

The first junction magnetic layer 141, the tunnel barrier 145, and thesecond junction magnetic layer 149 may constitute a magnetic tunneljunction of a magnetic memory cell. Data may be stored into a magneticmemory cell including the magnetic tunnel junction by using a differencebetween resistance values of the magnetic tunnel junction whether themagnetization directions of the free layer and the reference layer areparallel or anti-parallel each other. The magnetization direction of thefree layer may be varied according to the direction of the currentsupplied to the magnetic memory cell. For example, the magnetizationdirection of the free layer in the case of the current being suppliedfrom the first junction magnetic layer 141 to the second junctionmagnetic layer 149 may be anti-parallel to that in the case of thecurrent being supplied from the second junction magnetic layer 149 tothe first junction magnetic layer 141. The magnetization direction ofthe reference layer and the free layer may be vertical to the plane ofthe substrate 100. The reference layer may be vertical to the plane ofthe substrate 100 and have a fixed first magnetization direction. Thefree layer has a magnetization direction vertical to the plane of thesubstrate 100, and the magnetization direction of the free layer may bethe first magnetization direction or a second magnetization directionanti-parallel to the first magnetization according to the direction ofthe current supplied.

A capping layer 170 may be disposed on the second vertical magneticlayer 163. The capping layer 170 may include at least one selected fromthe group consisting of tantalum (Ta), aluminum (Al), copper (Cu), gold(Au), silver (Ag), titanium (Ti), ruthenium (Ru), magnesium (Mg),tantalum nitride (TaN), and/or titanium nitride (TiN).

Referring to FIG. 2, one modified example of a magnetic memory deviceaccording to some embodiments of inventive concepts will be described.Description of like elements substantially identical to the elementsdescribed in FIG. 1 may be omitted for the sake of clarity and/orconciseness.

A lower electrode 110 is disposed on a substrate 100. A seed layer 115and a first vertical magnetic layer 124 are disposed on the lowerelectrode 110. The seed layer 115 may include metal atoms constituting ahexagonal closed packing lattice (HCP). The seed layer 115 may be formedto have a thickness ranging from about 10 Å (Angstroms) to about 100 Å(Angstroms). The seed layer 115 may include ruthenium (Ru) or titanium(Ti). Conversely, the seed layer 115 may include metal atomsconstituting a face centered cubic lattice (FCC). For example, the seedlayer 115 may include platinum (Pt), palladium (Pd), gold (Au), silver(Ag), copper (Cu), and/or aluminum (Al). The seed layer 115 may includea single layer or a plurality of layers having different crystalstructures. Conversely, when a material constituting the first verticalmagnetic layer 124 is amorphous, the seed layer 115 may be omitted.

The magnetization direction of the first vertical magnetic layer 124 maybe substantially vertical to the plane of the substrate 100 andmodified. In order to achieve this, the first vertical magnetic layer124 may include at least one selected from the group consisting of amaterial with an L10 crystal structure, a material with a hexagonalclosed packing (HCP) lattice, and an amorphous rare-earth transitionmetal (RE-TM) alloy. For example, the first vertical magnetic layer 124may be at least one selected from materials with an L10 crystalstructure including Fe₅₀Pt₅₀, Fe₅₀Pd₅₀, Co₅₀Pt₅₀, Co₅₀Pd₅₀, and/orFe₅₀Ni₅₀. Conversely, the first vertical magnetic layer 124 may includea disordered cobalt-platinum alloy having a platinum content of about10% to about 45% by atomic percent or an ordered Co₃Pt alloy, with ahexagonal close packing (HCP) lattice. Conversely, the first verticalmagnetic layer 124 may include at least one from amorphous RE-TM alloysincluding at least one selected from the group consisting of iron (Fe),cobalt (Co), and/or nickel (Ni) and at least one selected from the groupconsisting of rare earth terbium (Tb), dysprosium (Dy), and/orgadolinium (Gd).

A first non-magnetic layer 130 may be disposed on the first verticalmagnetic layer 124. The first non-magnetic layer 130 may be formed witha thin thickness. For example, the first non-magnetic layer 130 may beformed to have a thickness in a range of about 2 Å (Angstroms) to about20 Å (Angstroms). The first non-magnetic layer 130 may not have atexture. For example, the first non-magnetic layer 130 may be uniformlyformed on the first vertical magnetic layer 124 and may not have atexture by the thin thickness.

The first non-magnetic layer 130 may include at least one selected fromnon-magnetic metal elements including a non-magnetic transition metal.In an embodiment, the first non-magnetic layer 130 may be formed with aplurality of layers. For example, the first non-magnetic layer 130 mayinclude a first lower metal compound layer 133, a first non-magneticmetal layer 136, and a first upper metal compound layer 139, which aresequentially stacked on the vertical magnetic layer 124. While not shownin FIG. 2, the first non-magnetic layer 130 may include a metal compoundlayer/non magnetic metal layer or a non-magnetic metal layer/metalcompound layer, which are sequentially stacked on the first verticalmagnetic layer 124. The non-magnetic metal layer may include at leastone selected from the group consisting of magnesium (Mg), aluminum (Al),titanium (Ti), chromium (Cr), ruthenium (Ru), copper (Cu), zinc (Zn),tantalum (Ta), gold (Au), silver (Ag), palladium (Pd), rhodium (Rh),iridium (Ir), molybdenum (Mo), vanadium (V), tungsten (W), niobdenum(Nb), zirconium (Zr), yttrium (Y), and/or hafnium (Hf). The first lowerand upper metal compound layers 133, 139 may be a metal oxide, a metalnitride, a metal oxynitride, or a combination thereof. For example, themetal compound layer may be a compound of the metal layer. Conversely,the first non-magnetic layer 130 may include only a single metal layeror a plurality of metal layers.

A first junction magnetic layer 141, a tunnel barrier 145, and a secondjunction magnetic layer 149 may be sequentially stacked on the firstnon-magnetic layer 130. The first junction magnetic layer 141, thetunnel barrier 145, and the second junction magnetic layer 149 mayconstitute a magnetic tunnel junction. The first junction magnetic layer141 may be strongly exchange-coupled with the first vertical magneticlayer 123 by the first non-magnetic layer 130. A vertical magneticanisotropy of the first junction magnetic layer 141 may be therebyenhanced. The first junction magnetic layer 141 and the second junctionmagnetic layer 149 may include a soft magnetic material. When a magneticmemory cell operates, one of the first junction magnetic layer 141 andthe second junction magnetic layer 149 may serve as a reference layerand the other may serve as a free layer. The junction magnetic layerserving as a free layer may have a saturation magnetization lower thanthat of the junction magnetic layer serving as a reference layer.

A second non-magnetic layer 150 may be disposed on the second junctionmagnetic layer 149. The second non-magnetic layer 150 may be formed witha thin thickness. For example, the second non-magnetic layer may beformed have a thickness in a range of about 2 Å (Angstroms) to about 20Å (Angstroms). The second non-magnetic layer 150 may not have a texture.For example, the second non-magnetic layer 150 may be uniformly formedon the second junction magnetic layer 149 and may not have a texture bythe thin thickness.

A second vertical magnetic layer 163 may be disposed on the secondnon-magnetic layer 150. The second vertical magnetic layer 163 may beconfigured such that it has a magnetization direction vertical to theplane of the substrate 100. For example, the second vertical magneticlayer 163 may include non-magnetic layers 161 and ferromagnetic layers162, alternately stacked, and the ferromagnetic layers 162 may be formedwith a thickness of one to several atoms. The magnetization direction ofthe ferromagnetic layers 162 may be vertical to the plane of thesubstrate 100. The second vertical magnetic layer 163 may beexchange-coupled with the second junction magnetic layer 149 by thesecond non-magnetic layer 150.

A capping layer 170 may be formed on the second vertical magnetic layer163. The capping layer 170 may include at least one selected from thegroup consisting of tantalum (Ta), aluminum (Al), copper (Cu), gold(Au), silver (Ag), titanium (Ti), ruthenium (Ru), magnesium (Mg),tantalum nitride (TaN), and/or titanium nitride (TiN).

Referring to FIG. 3, one modified example of a magnetic memory deviceaccording to embodiments of inventive concepts will be described. A seedlayer 115 and a first vertical magnetic layer 124 are sequentiallystacked on a substrate 100 and a lower electrode 110. The seed layer 115may include a single metal layer and a plurality of metal layers. Thefirst vertical magnetic layer 124 may include a material having an axiswhich is vertical to the plane of the substrate 100 and easilymagnetized. The first vertical magnetic layer 124 may include at leastone selected from the group consisting of a material with an L10 crystalstructure, a material with a hexagonal close packing (HCP) lattice, andan amorphous RE-TM alloy. When the first vertical magnetic layer 124includes an amorphous RE-TM alloy, the seed layer 115 may be omitted.

A first non-magnetic layer 130 may be disposed on the first verticalmagnetic layer 124. The first non-magnetic layer 130 may be formed witha thin thickness. For example, the first non-magnetic layer 130 may beformed to have a thickness in a range of about 2 Å (Angstroms) to about20 Å (Angstroms). The first non-magnetic layer 130 may not have atexture.

The first non-magnetic layer 130 may include at least one selected fromnon-magnetic metal elements including a non-magnetic transition metal.In an embodiment, the first non-magnetic layer 130 may be formed with aplurality of layers. For example, the first non-magnetic layer 130 mayinclude a first lower metal compound layer 133, a first non-magneticmetal layer 136, and a first upper metal compound layer 139, which aresequentially stacked on the vertical magnetic layer 124. Unlike theillustration, the first non-magnetic layer 130 may include a metalcompound layer/non-magnetic metal layer or a non-magnetic metallayer/metal compound layer, which are sequentially stacked on the firstvertical magnetic layer 124. Conversely, the first non-magnetic layer130 may include only a single metal layer or a plurality of metallayers. The first vertical magnetic layer 123 may be exchange coupledwith the first junction magnetic layer 141 by the first non-magneticlayer 130.

A first junction magnetic layer 141, a tunnel barrier 145, and a secondjunction magnetic layer 149 may be sequentially stacked on the firstnon-magnetic layer 130. The first junction magnetic layer 141 and thesecond junction magnetic layer 149 may include a soft magnetic material.When a magnetic memory cell operates, one of the first junction magneticlayer 141 and the second junction magnetic layer 149 may serve as areference layer and the other may serve as a free layer. The junctionmagnetic layer serving as a free layer may have a saturationmagnetization smaller than that of the junction magnetic layer servingas a reference layer.

A second non-magnetic layer 150 may be disposed on the second junctionmagnetic layer 149. The second non-magnetic layer 150 may be formed witha thin thickness. For example, the second non-magnetic layer 150 may beformed to have a thickness in a range of about 2 Å (Angstroms) to about20 Å (Angstroms). The second non-magnetic layer 150 may not have atexture.

A second vertical magnetic layer 164 is disposed on the secondnon-magnetic layer 150. The second vertical magnetic layer 164 may beconfigured such that it has a magnetization direction vertical to planesof a first junction magnetic layer and a second junction magnetic layer141, 149 constituting the magnetic tunnel junction. The second verticalmagnetic layer 164 may be exchange coupled with the second junctionmagnetic layer 149 by the second non-magnetic layer 150. For example,the second vertical magnetic layer 164 may include an amorphous RE-TMalloy. A capping layer 170 may be disposed on the second verticalmagnetic layer 164.

Referring to FIGS. 4A and 4C and FIG. 1, a method for forming a magneticmemory device according to embodiments of inventive concepts will bedescribed. Some of the description with reference to FIG. 1 may beomitted.

Referring to FIG. 4A, a lower electrode 110 may be formed on a substrate100. The lower electrode 110 may be formed on the substrate 100 and/orin the substrate 100.

Non-magnetic layers 121 and ferromagnetic layers 122 may be alternatelystacked on the lower electrode 110. The stacking numbers of thenon-magnetic layers 121 and the ferromagnetic layers 122 may be in arange of about 2 to about 20 times. The ferromagnetic layers 122 may beformed with a thickness of one to several atoms. The non-magnetic layers121 and ferromagnetic layers 122 may constitute a first verticalmagnetic layer 123.

Referring to FIG. 4B, a first lower metal compound layer 133 may beformed on the first vertical magnetic layer 123. A metal layer may bethinly formed on the first vertical magnetic layer 123, followed byoxidation and/or nitridation to form the first lower metal compoundlayer 133. The metal layer may include at least one selected from, forexample, transition metals.

A first non-magnetic metal layer 136 may be formed on the first lowermetal compound layer 133. The first non-magnetic metal layer 136 mayinclude at least one selected from non-magnetic metals, for example,non-magnetic transition metals. For example, the first non-magneticmetal layer 136 and the first lower metal compound layer 133 may includeat least one selected from the group consisting of magnesium (Mg),aluminum (Al), titanium (Ti), chromium (Cr), ruthenium (Ru), copper(Cu), zinc (Zn), tantalum (Ta), gold (Au), silver (Ag), palladium (Pd),rhodium (Rh), iridium (Ir), molybdenum (Mo), vanadium (V), tungsten (W),niobdenum (Nb), zirconium (Zr), yttrium (Y), and/or hafnium (Hf). Thefirst non-magnetic metal layer 136 may include a metal identical to thefirst lower metal compound layer 133.

Referring to FIG. 4C, a first upper metal compound layer 139 is formedon the first non-magnetic metal layer 136. The first upper metalcompound layer 139 may be formed by oxidation or nitridation of a topface of the first non-magnetic metal layer 136. For the oxidation ornitridation, a small amount of oxidation gas and/or nitridation gas maybe provided on a top face of the first upper metal compound layer 139.Conversely, a separate metal layer may be formed on the firstnon-magnetic metal layer 136, followed by oxidation and/or nitridationto form the first upper metal compound layer 139 or a separate metalcompound layer may be deposited to form the first upper metal compoundlayer 139.

A first junction magnetic layer 141, a tunnel barrier 145, and a secondjunction magnetic layer 149 may be sequentially formed on the firstupper metal compound layer 139. The first junction magnetic layer 141and the second junction magnetic layer 149 may include a soft magneticmaterial. In an embodiment, the first junction magnetic layer 141 andthe second junction magnetic layer 149 may include materials havingsaturation magnetizations different from each other. The first andsecond junction magnetic layers 149 may be formed in an amorphous state.In an embodiment, a process for oxidizing a top portion of the firstjunction magnetic layer 149 may be further included.

The tunnel barrier 145 may include at least one selected from the groupconsisting of magnesium (Mg), titanium (Ti), aluminum (Al), an oxide ofmagnesium-zinc (MgZn) and/or magnesium-boron (MgB), and/or a nitride oftitanium (Ti) and/or vanadium (V). Conversely, the tunnel barrier 145may include a plurality of layers. The plurality of layers may be atleast two layers selected from the group consisting of metal layers,metal oxide layers, metal nitride layers, and/or metal oxynitridelayers. The tunnel barrier 145 may have a predetermined crystalstructure, for example, a NaCl-type crystal structure.

A second junction magnetic layer 149 may be formed on the tunnel barrier145. When the second junction magnetic layer 149 is used as a free layerof a magnetic memory cell, the second junction magnetic layer 149 mayhave a saturation magnetization smaller than that of the first junctionmagnetic layer 141. Alternatively, the iron (Fe) content of the secondjunction magnetic layer 149 may be greater than or at least equal tothat of the first junction magnetic layer 141.

A top face of the second junction magnetic layer 149 may be oxidizedand/or nitrided. A pre-lower metal compound layer 152 may be therebyformed in a top portion of the second junction magnetic layer 149. A topface of the second junction magnetic layer 149 may be oxidized and/ornitrided in the same manner as in the top face of the first non-magneticmetal layer 136. Conversely, an oxidation and/or nitridation process ofthe second junction magnetic layer 149 may be omitted.

A second non-magnetic metal layer 156 may be formed on the secondjunction magnetic layer 149 and the pre-lower metal compound layer 152.The second non-magnetic metal layer 156 may include at least oneselected from the group consisting of magnesium (Mg), aluminum (Al),titanium (Ti), chromium (Cr), ruthenium (Ru), copper (Cu), zinc (Zn),tantalum (Ta), gold (Au), silver (Ag), palladium (Pd), rhodium (Rh),iridium (Ir), molybdenum (Mo), vanadium (V), tungsten (W), niobdenum(Nb), zirconium (Zr), yttrium (Y), and/or hafnium (Hf).

Referring again to FIG. 1, a second upper metal compound layer 159 isformed on the second non-magnetic metal layer 156. The second uppermetal compound layer 159 may be formed by oxidation or nitridation of atop face of the second non-magnetic metal layer 156. For the oxidationor nitridation, a small amount of oxidation gas and/or nitridation gasmay be provided on a top face of the second upper metal compound layer159. Conversely, a separate metal layer may be formed on the secondnon-magnetic metal layer 156, followed by oxidation and/or nitridationto form the second upper metal compound layer 159 or a separate metalcompound layer may be deposited to form the second upper metal compoundlayer 159.

Non-magnetic layers 161 and ferromagnetic layers 162 may be alternatelystacked on the second upper metal compound layer 159. The ferromagneticlayers 162 may be formed with a thickness of one to several atoms. Thenon-magnetic layers 161 and the ferromagnetic layers 162 may be includedin a second vertical magnetic layer 163. The stacking numbers of thenon-magnetic layers 161 and ferromagnetic layers 162 in the secondvertical magnetic layer 163 may be different from those of thenon-magnetic layers 121 and ferromagnetic layers 122 in the firstvertical magnetic layer 123.

Prior to and/or after a formation of the second vertical magnetic layer163, an annealing process may be performed. Through the annealingprocess, the amorphous first and second junction magnetic layers 141,149 may be crystallized into a seed layer of the tunnel barrier 145. Theannealing process may be a magnetic annealing process or anotherannealing process. As the tunnel barrier 145 serves as a seed layer, thetunnel barrier 145 may have a crystal structure similar to those of thefirst and second junction layers 141, 149. Alternatively, faces of thefirst and second junction layers 141, 149, contacting the tunnel barrier145, may have crystal planes equal to the face of the tunnel barrier.For example, when top and bottom faces of the tunnel barrier 145correspond to a (001) crystal plane of a NaCl-type crystal structure,faces of the first and second junction magnetic layers 141, 149,contacting the tunnel barrier 145, may be a (001) crystal plane of abody centered cubic structure.

During the annealing, the first and second non-magnetic layers 130, 150may prevent the crystallization of the first and second junctionmagnetic layers 141, 149 along the crystal structure of layers differentfrom the tunnel barrier 145. For example, when the first and secondnon-magnetic layers 130, 150 are omitted, the crystallization of thefirst and second junction magnetic layers 141, 149 may be affected bythe first and second vertical magnetic layers 123, 163. In this case,the first and second junction magnetic layers 141, 149 may not havecrystal structures and/or crystal planes equal to those of the tunnelbarrier 145. When the first and second junction magnetic layers 141, 149have crystal structures and/or crystal planes different from those ofthe tunnel barrier 145, the resistance ratio of the magnetic tunneljunction including these may be significantly reduced. However, whenfirst and second non-magnetic layers 130, 150 are interposed between thefirst vertical magnetic layer 123 and the first junction magnetic layer141 and/or between the second vertical magnetic layer 163 and the secondjunction magnetic layer 140 according to embodiments of inventiveconcepts, the first and second vertical magnetic layers 123, 163 may notserve as a seed layer for crystallization of the first and secondjunction magnetic layers 141, 149. Accordingly, the crystal structuresof the first and second junction magnetic layers 141, 149 may align withcrystal structure of the tunnel barrier 145. Therefore, themagnetoresistance ratio of a magnetic tunnel junction including thesemay be enhanced.

A capping layer 170 may be formed on the second vertical magnetic layer163. The capping layer 170 may include at least one selected from thegroup consisting of tantalum (Ta), aluminum (Al), copper (Cu), gold(Au), silver (Ag), titanium (Ti), ruthenium (Ru), magnesium (Mg),tantalum nitride (TaN), and/or titanium nitride (TiN).

The first vertical magnetic layer 123, the first non-magnetic layer 130,the first junction magnetic layer 141, the tunnel barrier 145, thesecond junction magnetic layer 149, the second non-magnetic layer 150,the second vertical magnetic layer 163, and the capping layer 170 may bepatterned. The patterning may be performed by one selected from variouspatterning processes including photolithography and/or electron beampatterning. The patterning may be performed after all the layers areformed, or after some of the layers are formed. When only some of thelayers are patterned, an additional patterning may be performed afterthe others of the layers are formed.

Referring to FIG. 2, a method for forming a modified example of amagnetic memory device according to embodiments of inventive conceptswill be described. Description of methods for forming elements describedwith reference to FIG. 1 is omitted.

A seed layer 115 may be formed on a substrate 100. The seed layer 115may include a single metal layer or a plurality of metal layers. Theseed layer 115 may include a metal layer having a predetermined crystalstructure. For example, the seed layer 115 may have at least one crystalstructure selected from the group consisting of body-centered cubiclattice (BCC), face-centered cubic lattice (FCC), and hexagonal closepacking (HCP) lattice.

A first vertical magnetic layer 124 may be formed on the seed layer 115.The first vertical magnetic layer 124 may be deposited using the seedlayer 115 as a seed. The first vertical magnetic layer 124 depositedusing the seed layer 115 as a seed may have a HCP or an L10 crystalstructure. When the first vertical magnetic layer 124 is formed of anamorphous RE-TM alloy, the seed layer 115 may be omitted.

Referring to FIG. 3, a method for forming a modified example of amagnetic memory device according to embodiments of inventive conceptswill be described. Description of methods for forming elements describedwith reference to FIGS. 1 and 2 is omitted.

A second vertical magnetic layer 164 is formed on a second non-magneticlayer 150. The second vertical magnetic layer 164 may include, forexample, an amorphous RE-TM alloy. While not shown, the second verticalmagnetic layer 164 may include a plurality of ferromagnetic layers. Anon-magnetic metal layer may be interposed between the ferromagneticlayers. The second vertical magnetic layer 164 may be modified invarious shapes within the scope of ferromagnetic material layers havinga vertical magnetization direction.

(A Second Embodiment)

Referring to FIG. 5, a magnetic memory device according to secondembodiments of inventive concepts will be described.

A lower electrode 210 is disposed on a substrate 200. The substrate 200may be a semiconductor-based semiconductor substrate. The substrate 200may include a conductive region and/or an insulating region. The lowerelectrode 210 may be electrically connected to the conductive region ofthe substrate 200. The lower electrode 210 may be disposed on thesubstrate 200 and/or in the substrate 200. The lower electrode 210 mayhave any selected from the group consisting of a line, island, and/orplate.

A pinning layer 226 is disposed on the lower electrode 210. The pinninglayer may include an antiferromagnetic material. For example, thepinning layer 226 may include at least one selected from the groupconsisting of PtMn, IrMn, FeMn, NiMn, MnO, MnS, MnTe, MnF₂, FeF₂, FeCl₂,FeO, CoCl₂, CoO, NiCl₂, NiO, and/or Cr. The pinning layer 226 may fixthe magnetization direction of an adjacent magnetic layer in onedirection.

A lower reference layer 227 may be provided on the pinning layer 226.The lower reference layer 227 may include a ferromagnetic material. Forexample, the lower reference layer 227 may include at least one selectedfrom the group consisting of CoFeB, Fe, Co, Ni, Gd, Dy, CoFe, NiFe,MnAs, MnBi, MnSb, CrO₂, MnOFe₂O₃, FeOFe₂O₃, NiOFe₂O₃, CuOFe₂O₃, EuO,and/or Y₃Fe₅O₁₂. The magnetization direction of the lower referencelayer 227 may be fixed to one direction by the pinning layer 226. Theone direction may be selected from directions parallel to the plane ofthe substrate 200. For another example, the lower reference layer 227may include at least one selected from the group consisting of amaterial with an L10 crystal structure, a material with a HCP, and anamorphous RE-TM alloy. In this case, the magnetization direction of thelower reference layer 227 may be vertical (perpendicular) to the planeof the substrate 200.

A reference exchange-coupling layer 228 may be disposed on the lowerreference layer 227. The reference exchange-coupling layer 228 mayinclude at least one selected from the group consisting of ruthenium(Ru), iridium (Ir), chromium (Cr), and/or rhodium (Rh).

An upper reference layer 241 may be formed on the referenceexchange-coupling layer 228. The upper reference layer 241 may includeiron (Fe). The upper reference layer 241 may include at least oneselected from the group consisting of cobalt (Co) and/or nickel (Ni),The upper reference layer 241 may further include at least one fromnon-magnetic materials including boron (B), zinc (Zn), aluminum (Al),titanium (Ti), ruthenium (Ru), tantalum (Ta), silicon (Si), silver (Ag),gold (Au), copper (Cu), carbon (C), and/or nitrogen (N). The upperreference layer 241 may be exchange-coupled with the lower referencelayer 227 by the reference exchange-coupling layer 228.

A tunnel barrier 245 may be formed on the upper reference layer 241. Thetunnel barrier 245 may include a non-magnetic material. The tunnelbarrier 245 may include at least one selected from the group consistingof magnesium (Mg), titanium (Ti), aluminum (Al), an oxide ofmagnesium-zinc (MgZn) and/or magnesium-boron (MgB), and/or a nitride oftitanium (Ti) and/or vanadium (V). For example, the tunnel barrier 245may be a magnesium oxide (MgO) layer. Conversely, the tunnel barrier 245may include a plurality of layers including a metal layer and a metalcompound layer.

The tunnel barrier 245 may have a crystal structure similar to that ofthe upper reference layer 241. For example, the tunnel barrier 245 andthe upper reference layer 241 may have a NaCl-type crystal structure anda body-centered cubic structure, respectively. The interface between thetunnel barrier 245 and the upper reference layer 241 may includeidentical crystal planes. For example, the (001) crystal plane of thetunnel barrier 245 may include the (001) crystal plane of the upperreference layer 241.

A lower free layer 249 may be disposed on the tunnel barrier 245. Thelower free layer 249 may include iron (Fe). The lower free layer 249 mayinclude at least one selected from the group consisting of cobalt (Co)and/or nickel (Ni). The upper reference layer 241 may further include atleast one from non-magnetic materials including boron (B), zinc (Zn),aluminum (Al), titanium (Ti), ruthenium (Ru), tantalum (Ta), silicon(Si), silver (Ag), gold (Au), copper (Cu), carbon (C), and/or nitrogen(N).

The iron (Fe) content in the lower free layer 249 may be higher thanthat in the upper reference layer 241. The reliability of a magneticmemory cell including the upper reference layer 241 and the lower freelayer 249 may be enhanced by the high iron content in the lower freelayer 249. When the iron content in the reference layer is high betweenthe reference layer and the free layer constituting a magnetic tunneljunction, the magnetic memory cell including the magnetic tunneljunction may show an abnormal switching behavior. In one example, themagnetization direction of a free layer including a relatively low ironcontent may not be maintained in a direction parallel to themagnetization direction of the reference layer. Accordingly, when themagnetic memory cell is switched into a parallel state (a state in whichthe magnetization direction of the free layer is parallel to themagnetization direction of the reference layer), the magnetizationdirection of the free layer may be abnormally reversed. The reliabilityof a magnetic memory cell including the free layer may be degraded bythese abnormal switching phenomena. However, the lower free layer 249may have a higher iron content than the upper reference layer 241according to embodiments of inventive concepts. Accordingly, themagnetization direction of the lower free layer 249 in a switchingaction of a magnetic memory cell into a parallel state may be stablymaintained in a state parallel to the magnetization direction of theupper reference layer 241. The magnetization direction of the lower freelayer 249 may not be abnormally reversed. Therefore, the reliability ofa magnetic memory cell including the lower free layer 249 may beenhanced.

A free exchange-coupling layer 265 may be disposed on the lower freelayer 249. The free exchange-coupling layer 265 may include at least oneselected from the group consisting of ruthenium (Ru), iridium (Ir),chromium (Cr), and/or rhodium (Rh).

An upper free layer 266 may be disposed on the free exchange-couplinglayer 265. The upper free layer 266 may include a ferromagneticmaterial. For example, the upper free layer 266 may include at least oneselected from the group consisting of CoFeB, Fe, Co, Ni, Gd, Dy, CoFe,NiFe, MnAs, MnBi, MnSb, CrO₂, MnOFe₂O₃, FeOFe2O3, NiOFe₂O₃, CuOFe₂O₃,EuO, and/or Y₃Fe₅O₁₂. When a magnetic memory cell operates, themagnetization direction of the upper free layer 266 may be changed intoa first direction or a second direction parallel to the plane of thesubstrate 200. For another example, the upper free layer 266 may includeat least one selected from amorphous RE-TM alloys. In this case, themagnetization direction of the upper free layer 266 may be changed intoa first direction or a second direction vertical to the plane of thesubstrate 200 when a magnetic memory cell operates. The upper free layer266 may be exchange coupled with the lower free layer 249 by the freeexchange-coupling layer 265.

A capping layer 270 is disposed on the upper free layer 266. The cappinglayer 270 may include at least one selected from the group consisting oftantalum (Ta), aluminum (Al), copper (Cu), gold (Au), silver (Ag),titanium (Ti), tantalum nitride (TaN), and/or titanium nitride (TiN).

While not shown, positions of the lower and upper free layers 249, 266and the lower and upper reference layers 227, 241 may be changed. Forexample, the lower and upper free layers 249, 266 may be disposed underthe tunnel barrier 245, and the lower and upper reference layers 227,241 may be disposed over the tunnel barrier 245. In this case, an upperfree layer 266, a free exchange-coupling layer 265, and a lower freelayer 249 may be sequentially stacked between the lower electrode 210and the tunnel barrier 245, while an upper reference layer 241, areference exchange-coupling layer 228, and a lower reference layer 227may be sequentially stacked between the tunnel barrier 245 and thecapping layer 270.

Referring to FIG. 6, a modified example of a magnetic memory deviceaccording to second embodiments of inventive concepts will be described.Description of elements described with reference to FIG. 5 may beomitted.

A vertical lower reference layer 223 may be disposed on a lowerelectrode 210. The vertical lower reference layer 223 may includenon-magnetic layers 221 and ferromagnetic layers 222 alternatelystacked. The ferromagnetic layers 222 may include at least one selectedfrom the group consisting of iron (Fe), cobalt (Co), and/or nickel (Ni),while the non-magnetic layers 121 may include at least one selected fromthe group consisting of chromium (Cr), platinum (Pt), palladium (Pd),iridium (Ir), ruthenium (Ru), rhodium (Rh), osmium (Os), rhenium (Re),gold (Au), and/or copper (Cu). For example, the vertical lower referencelayer 223 may include [Co/Pt]m, [Co/Pd]m, or [Ni/Pt]m (m is a stackingnumber of each layer and a natural number of 2 or more). In someembodiments, the non-magnetic layers 221 and ferromagnetic layers 222may be stacked about 2 to about 20 times, respectively. When the currentflows in a direction vertical to the substrate 200 and the planes of thevertical lower reference layers 223, the vertical lower reference layer223 may be configured such that it has a magnetization directionparallel to the current. For this configuration, the ferromagneticlayers 222 may be thinly formed with a thickness of one to severalatomic layers.

A vertical upper free layer 263 may be disposed on a lower free layer249. The vertical upper free layer 263 may include non-magnetic layers261 and ferromagnetic layers 262 alternately stacked. The ferromagneticlayers 262 may include at least one selected from the group consistingof iron (Fe), cobalt (Co), and/or nickel (Ni), while the non-magneticlayers 261 may include at least one selected from the group consistingof chromium (Cr), platinum (Pt), palladium (Pd), iridium (Ir), ruthenium(Ru), rhodium (Rh), osmium (Os), rhenium (Re), gold (Au), and/or copper(Cu). For example, the vertical upper free layer 263 may include[Co/Pt]n, [Co/Pd]n, and/or [Ni/Pt]n (n is a stacking number of eachlayer and a natural number of 2 or more). In some embodiments, thenon-magnetic layers 261 and ferromagnetic layers 262 may be stackedabout 2 to about 20 times, respectively. The stacking number n ofnon-magnetic layers 261 and ferromagnetic layers 262 in the verticalupper free layer 263 may be smaller than the stacking number m ofnon-magnetic layers 221 and ferromagnetic layers 222 in the verticallower reference layer 223.

Referring again to FIG. 5, a method for forming a magnetic memory deviceaccording to second embodiments of inventive concepts will be described.A lower electrode 210 is formed on a substrate 200. The lower electrode210 may be formed on the substrate 200 and/or in the substrate 200.

A pinning layer 226 is formed on the lower electrode 210. The pinninglayer 226 may include an anti-ferromagnetic material. In someembodiments, a seed layer may be formed as a substitute for the pinninglayer 226. The seed layer may include a metal with a predeterminedcrystal structure, or a metal alloy.

A lower reference layer 227 may be formed on the pinning layer 226. Thelower reference layer 227 may include a ferromagnetic material. Forexample, the lower reference layer 227 may include at least one selectedfrom the group consisting of CoFeB, Fe, Co, Ni, Gd, Dy, CoFe, NiFe,MnAs, MnBi, MnSb, CrO₂, MnOFe₂O₃, FeOFe₂O₃, NiOFe₂O₃, CuOFe₂O₃, EuO,and/or Y₃Fe₅O₁₂. For another example, the lower reference layer 227 mayinclude at least one selected from the group consisting of a materialwith an L10 crystal structure, a material with a hexagonal close packing(HCP) lattice, and an amorphous RE-TM alloy.

A reference exchange-coupling layer 228 may be formed on the lowerreference layer 227. The reference exchange-coupling layer 228 mayinclude at least one selected from the group consisting of ruthenium(Ru), iridium (Ir), chromium (Cr), and/or rhodium (Rh).

An upper reference layer 241, a tunnel barrier 245, and a lower freelayer 249 may be formed on the reference exchange-coupling layer 228.The upper reference layer 241 and the lower free layer 249 may be formedin an amorphous state, while the tunnel barrier 245 may be formed in aNaCl-type crystal state. The crystal structure of the upper referencelayer 241 and the lower free layer 249 may align with the crystalstructure of the tunnel barrier 245 by a subsequent annealing process.

A free exchange-coupling layer 265 may be formed on the lower free layer249. The reference exchange-coupling layer 228 may include at least oneselected from the group consisting of ruthenium (Ru), iridium (Ir),chromium (Cr), and/or rhodium (Rh).

An upper free layer 266 may be formed on the free exchange-couplinglayer 265. The upper free layer 266 may include a ferromagneticmaterial. A capping layer 270 may be formed on the upper free layer 266.

Layers stacked on the lower electrode 210 are patterned. The patterningmay be performed by at least one selected from various patterningprocesses including photolithography and electron beam. The patterningmay be performed after all the layers are formed, or after some of thelayers are formed. When only some of the layers are patterned, anadditional patterning may be performed after the others of the layersare formed.

Referring to FIG. 6, a method for forming a modified example of amagnetic memory device according to second embodiments of inventiveconcepts will be described. Description of methods for forming elementspreviously described in FIG. 5 is omitted.

Non-magnetic layers 221 and ferromagnetic layers 222 may be alternatelystacked on a lower electrode 210. The ferromagnetic layers 222 may bedeposited with a thickness of one to several atoms. The non-magneticlayers 221 and ferromagnetic layers 222 formed on the lower electrode210 may constitute a vertical lower reference layer 223.

Non-magnetic layers 261 and ferromagnetic layers 262 may be alternatelystacked on the lower free layer 249. The ferromagnetic layers 262 may beformed with a thickness of one to several atoms. Non-magnetic layers 221and ferromagnetic layers 222, formed on the lower free layer 249, mayconstitute a vertical upper free layer 263.

The stacking number of the non-magnetic layers 221 and the ferromagneticlayers 222 in the vertical lower reference layer 223 may be greater thanthe stacking number of the non-magnetic layers 261 and the ferromagneticlayers 262 in the vertical upper free layer 262.

(Third Embodiment)

Referring to FIG. 7, a magnetic memory device according to thirdembodiments of inventive concepts will be described. A lower electrode320 is disposed on a substrate 310. The substrate 310 may be any oneselected from various substrates including a semiconductor element-basedsubstrate and a metal compound-based substrate. The substrate 310 mayinclude a conductive region and/or an insulating region. Although thelower electrode 320 is illustrated as being disposed on the substrate310, the electrode may be included in the substrate 310. The lowerelectrode 320 may be an electrode or electrode contact. The lowerelectrode 320 may be electrically connected to the conductive region inthe substrate 310. For example, the lower electrode 320 may beelectrically connected to at least one selected from switching devicesincluding a transistor and a diode included in the substrate 310.

A seed layer 330 is disposed on the substrate 310. The seed layer 330may include metal atoms constituting a hexagonal close-packing (HCP)lattice. As illustrated in FIG. 9, the HCP may be a lattice includingthree a-axes, three b-axes constituting a hexagonal plane with thea-axes, and c-axes substantially vertical to the hexagonal plane.

A hexagonal plane constituted by the a-axes and b-axes may besubstantially parallel to the plane of the substrate 310, while thec-axes may be substantially vertical to the plane of the substrate 310.The (001) crystal plane of a crystal structure constituting the seedlayer 330 may be parallel to the plane of the substrate 310. The seedlayer 330 may be thinly formed. For example, the seed layer 330 may beformed to have a thickness in a range of about 10 Å (Angstroms) to about100 Å (Angstroms). The seed layer 330 may include ruthenium (Ru) and/ortitanium (Ti), Conversely, the seed layer 330 may include metal atomsconstituting a face-centered cubic (FCC) lattice. For example, the seedlayer 330 may include platinum (Pt), palladium (Pd), gold (Au), silver(Ag), copper (Cu), and/or aluminum (Al).

A free magnetic substance 340 may be disposed on the seed layer 330. Thefree magnetic substance 340 may include a vertical free magnetic layer342 contacting the seed layer 330 and a junction free magnetic layer 348on the vertical free magnetic layer 342. Unlike the illustration, thevertical free magnetic substance 342 and the junction free magneticlayer 348 may include a plurality of layers.

The vertical free magnetic layer 342 may include a ferromagneticmaterial. Atoms included in the vertical free magnetic layer 342 mayconstitute a HCP lattice. As illustrated in FIG. 9, the HCP lattice ofthe vertical free magnetic layer 342 may include an a-axis, a b-axis,and a c-axis. The c-axis of the HCP lattice constituting the verticalfree magnetic layer 342 may be substantially vertical to the plane ofthe substrate 310. The (001) plane of the HCP lattice constituting thevertical free magnetic layer 342 may be parallel to the plane of thesubstrate 310. The easily magnetized axis of the vertical free magneticlayer 342 may be the c-axis. Accordingly, the magnetization direction ofthe vertical free magnetic layer 342 may be vertical to the substrate310. The vertical free magnetic layer 342 may have a magnetic anisotropyin a direction vertical to the plane of the substrate 310.

The ferromagnetic properties and the lattice structure of the verticalfree magnetic layer 342 may be due to kinds of atoms constituting thevertical free magnetic layer 342 and/or the content of the atoms.

In some embodiments, the vertical free magnetic layer 342 may include adisordered cobalt-platinum alloy having a platinum content in a range ofabout 10% to about 45% by atomic percent. The platinum atom content inthe vertical free magnetic layer 342 may be in a range of about 20% toabout 30% by atomic percent. The vertical free magnetic layer 342 mayfurther include a non-magnetic material. For example, the vertical freemagnetic layer 342 may further include at least one selected from thegroup consisting of boron (B), chromium (Cr), and/or copper (Cu).

In other embodiments, the vertical free magnetic layer 342 may includeCo₃Pt which is an ordered alloy. The vertical free magnetic layer 342may further include a non-magnetic material. For example, the verticalfree magnetic layer 342 may further include at least one selected fromthe group consisting of boron (B), chromium (Cr), silicon (Si), and/orcopper (Cu).

In other embodiments, the vertical free magnetic layer 342 may be formedin the form of a plurality of layers. In this case, the vertical freemagnetic layer 342 may include a first free ferromagnetic layer having aHCP lattice and a second free ferromagnetic layer on the first freeferromagnetic layer, which are sequentially stacked on the seed layer330. The first free ferromagnetic layer may be one selected fromembodiments of the vertical free magnetic layer 342 previouslydescribed, while the second free ferromagnetic layer may be an alloyincluding at least one selected from the group consisting of iron (Fe),cobalt (Co), and/or nickel (Ni) and at least one selected fromrare-earth metals. For example, the rare-earth metal may be at least oneselected from the group consisting of terbium (Tb), dysprosium (Dy),and/or gadolinium (Gd). Conversely, the second free ferromagnetic layermay be at least one selected from ferromagnetic materials with a L10crystal structure including Fe₅₀Pt₅₀, Fe₅₀Pd₅₀, Co₅₀Pt₅₀, Co₅₀Pd₅₀,and/or Fe₅₀Ni₅₀.

The vertical free magnetic layer 342 may have a high vertical magneticanisotropy by a crystal structure of the vertical free magnetic layer342, that is, a HCP lattice structure of the vertical free magneticlayer 342. In the specification, the vertical magnetic anisotropy meansa magnetic anisotropy in a direction vertical to the plane of thesubstrate 310. The reliability of a magnetic memory device including thevertical free magnetic layer 342 may be enhanced and the operating powerof the magnetic memory may be reduced by the high vertical magneticanisotropy. Specifically, the spin direction of many electrons amongelectrons transmitting through the vertical free magnetic layer 342 maybe aligned in a direction vertical to the plane of the substrate 310 bythe vertical free magnetic layer 342. Accordingly, many electrons amongelectrons transmitting through the vertical free magnetic layer 342 maybe substantially used in the write operation of the magnetic memorydevice. Therefore, the reliability of a magnetic memory device may beenhanced, and the magnetic memory device may be operated using arelatively small amount of a switching current.

A lower exchange-coupling control layer 344 may be disposed on thevertical free magnetic layer 342. The lower exchange-coupling controllayer 344 may include a magnetic material with a large exchange-couplingconstant or a non-magnetic material which may increase the surfacemagnetic anisotropy. For example, the lower exchange-coupling controllayer 344 may include at least one from iron (Fe), cobalt (Co), and/ornickel (Ni), which have a large exchange coupling constant. The lowerexchange-coupling control layer 344 may further include platinum (Pt).The thickness of the lower exchange-coupling control layer 344 may be ina range of about 2 Å (Angstroms) to about 20 Å (Angstroms). The lowerexchange-coupling control layer 344 may reinforce an exchange-couplingbetween the vertical free magnetic layer 342 and a junction freemagnetic layer 348 which will be described. Because the vertical freemagnetic layer 342 has a high magnetic anisotropy in a directionvertical to the plane of the substrate 310, the junction free magneticlayer 348 exchange-coupled by the vertical free magnetic layer 342 andthe lower exchange-coupling control layer 344 may also have a highmagnetic anisotropy in a direction vertical to the plane of thesubstrate 310.

For another example, the lower exchange-coupling control layer 344 mayinclude at least one selected from metal elements including a transitionmetal. The lower exchange-coupling control layer 344 may include atleast one selected from non-magnetic metals including titanium (Ti),chromium (Cr), ruthenium (Ru), rhodium (Rh), copper (Cu), magnesium(Mg), zinc (Zn), aluminum (Al), tantalum (Ta), palladium (Pd), and/orplatinum (Pt). Accordingly, the lower exchange-coupling control layer344 may increase the vertical magnetic anisotropy of the surface of theadjacent magnetic layers.

In an embodiment, the lower exchange-coupling control layer 344 mayfurther include an oxide layer on the surface of the lowerexchange-coupling control layer 344. The oxide layer may be an oxide ofa material constituting the surface of the lower exchange-couplingcontrol layer 344.

A junction free magnetic layer 348 may be disposed on the lowerexchange-coupling control layer 344. The junction free magnetic layer348 may have a high vertical anisotropy by the lower exchange-couplingcontrol layer 344 and/or the vertical free magnetic layer 342. Forexample, the junction free magnetic layer 348 may be stronglyexchange-coupled by the vertical free magnetic layer 342 and the lowerexchange-coupling control layer 344, which have a high verticalanisotropy. For another example, the vertical magnetic anisotropy of thesurface of the junction free magnetic layer 348 may be enhanced by thelower exchange-coupling control layer 344 including the non-magneticmetals.

The junction free magnetic layer 348 may include a soft magneticmaterial. The junction free magnetic layer 348 may have a low dampingconstant and a high spin polarization ratio. For example, the junctionfree magnetic layer 348 may include cobalt (Co), iron (Fe), and/ornickel (Ni) atoms. The junction free magnetic layer 348 may furtherinclude at least one from non-magnetic materials including boron (B),zinc (Zn), aluminum (Al), titanium (Ti), ruthenium (Ru), tantalum (Ta),silicon (Si), silver (Ag), gold (Au), copper (Cu), carbon (C), and/ornitrogen (N). Specifically, the junction free magnetic layer 348 mayinclude CoFe and/or NiFe, and may further include boron (B). To furtherdecrease the saturation magnetization of the junction free magneticlayer 348, the junction free magnetic layer 348 may further include atleast one selected from the group consisting of titanium (Ti), aluminum(Al), silicon (Si), magnesium (Mg), tantalum (Ta), and/or silicon (Si).As the saturation magnetization decreases, the switching current of amagnetic memory cell including the junction free magnetic layer 348 maybe decreased.

While not shown, the junction free magnetic layer 348 may include aplurality of magnetic layers. For example, the junction free magneticlayer 348 may include a first free ferromagnetic layer, a freenon-magnetic layer, and a second free ferromagnetic layer, that is, asynthetic anti-ferromagnet (SAF) layer, which are sequentially stackedon the lower exchange-coupling magnetic layer 344. The junction freemagnetic layer 348 may include magnetic layers having a changeablemagnetization direction in various shapes.

The magnetization direction of at least one layer from a plurality oflayers constituting the free magnetic substance 340 may be changed. Forexample, the junction free magnetic layer 348 may have a changeablemagnetization direction. The magnetization direction of the junctionfree magnetic layer 348 may be changed into a first direction verticalto the substrate 310 or into a second direction anti-parallel to thefirst direction by electric and/or magnetic factors provided from theoutside of the junction free magnetic layer 348.

A tunnel barrier 350 may be disposed on the free magnetic substance 340.The tunnel barrier 350 may have a thickness thinner than the spindiffusion distance. The tunnel barrier 350 may include a non-magneticmaterial. In some embodiments, the tunnel barrier 350 may be formed ofan insulating material layer. For example, the tunnel barrier 350 mayinclude at least one selected from the group consisting of magnesium(Mg)/magnesium oxide (MgO), magnesium oxide (MgO)/magnesium (Mg), and/ormagnesium (Mg)/magnesium oxide (MgO)/magnesium (Mg).

A reference magnetic substance 360 may be formed on the tunnel barrier350. The reference magnetic substance 360 may include a junctionreference magnetic layer 361, an upper exchange-coupling control layer362, and the vertical reference magnetic layer 363, which aresequentially stacked on the tunnel barrier 350. A plurality of upperreference non-magnetic layers 364 and reference ferromagnetic layers 365may be alternately stacked on the vertical reference magnetic layer 363.

The junction reference magnetic layer 361 may include a soft magneticmaterial. For example, the junction reference magnetic layer 361 includecobalt (Co), iron (Fe), and/or nickel (Ni), and the contents of theatoms may be determined such that the saturation magnetization of thejunction reference magnetic layer 361 may be lowered. The junctionreference magnetic layer 361 may have a low damping constant and a highspin polarization ratio. For this purpose, the junction referencemagnetic layer 361 may further include at least one from non-magneticmaterials including boron (B), zinc (Zn), aluminum (Al), titanium (Ti),ruthenium (Ru), tantalum (Ta), silicon (Si), silver (Ag), gold (Au),copper (Cu), carbon (C), and/or nitrogen (N). For example, the junctionreference magnetic layer 361 may include CoFe and/or NiFe, and mayfurther include boron. Furthermore, the junction reference magneticlayer 361 may further include at least one selected from non-magneticelements including titanium (Ti), aluminum (Al), silicon (Si), magnesium(Mg), and/or tantalum (Ta). The content of the selected non-magneticelement in the junction reference magnetic layer 361 may be in a rangeof about 1% to about 15% by atomic percent.

The junction free magnetic layer 348, the tunnel barrier 350, and thejunction reference magnetic layer 361 may constitute a magnetic tunneljunction. A magnetic memory cell according to embodiments of inventiveconcepts may store data by using the difference of resistance valueswhether the magnetization directions of two magnetic substancesconstituting the magnetic tunnel junction, the junction free magneticlayer 348 and the junction reference magnetic layer 361, are parallel oranti-parallel to each other. Specifically, according to directions ofelectrons transmitting through the magnetic tunnel junction, themagnetization direction of the junction free magnetic layer 348 may bechanged.

For example, when electrons move in a direction from the junction freemagnetic layer 348 to the junction reference magnetic layer 361,electrons having a spin in a first direction of the magnetizationdirection parallel to that of the junction reference magnetic layer 361may transmit through the junction reference magnetic layer 361, whileelectrons having a spin in a second direction of the magnetizationanti-parallel to that of the junction reference magnetic layer 361 maynot transmit through the junction reference magnetic layer 361 (e.g.,are reflected) and are transferred to the junction free magnetic layer348. The magnetization direction of the junction free magnetic layer 348may be a second direction by electrons having a spin in the seconddirection. Accordingly, the junction reference magnetic layer 361 andthe junction free magnetic layer 348 may have a magnetization directionanti-parallel to each other. A magnetic tunnel junction constituted bymagnetic substances having magnetization directions anti-parallel toeach other may have a relatively high resistance value. In presentembodiments, the first direction and the second direction may bedirections substantially vertical (perpendicular) to the plane of thesubstrate 310.

For another example, when electrons move from the junction referencemagnetic layer 361 to the junction free magnetic layer 348, electronshaving a spin in a first direction, transmitting through the junctionreference magnetic layer 361 may arrive at the junction free magneticlayer 348. The magnetization direction of the junction free magneticlayer 348 may be changed into the first direction by electrons having aspin in the first direction, which have arrived at the junction freemagnetic layer 348. Accordingly, the junction reference magnetic layer361 and junction free magnetic layer 348 may have a magnetizationdirection in a first direction. A magnetic tunnel junction constitutedby magnetic substances having magnetization directions parallel to eachother may have a relatively low resistance value.

In this way, the resistance values of the magnetic tunnel junction maybe varied according to the direction of electrons flowing through themagnetic tunnel junction. Data may be stored into the magnetic memorycell by using the difference of the resistance values.

An upper exchange-coupling control layer 362 may be disposed on thejunction reference magnetic layer 361. The upper exchange-couplingcontrol layer 362 may include a material with a large exchange-couplingconstant, for example, a ferromagnetic metal, or a material which maycontrol the orientation of an adjacent magnetic substance, for example,a non-magnetic metal. For example, the upper exchange-coupling controllayer 362 may include at least one selected from the group consisting ofiron (Fe), cobalt (Co), and/or nickel (Ni). For another example, theupper exchange-coupling control layer 364 may include at least oneselected from the group consisting of titanium (Ti), chromium (Cr),ruthenium (Ru), rhodium (Rh), copper (Cu), magnesium (Mg), zinc (Zn),aluminum (Al), tantalum (Ta), palladium (Pd), and/or platinum (Pt). Insome embodiments, the upper exchange-coupling control layer 362 mayfurther include an oxide layer on the surface of the upperexchange-coupling control layer 362. The oxide layer may be a layerformed by oxidation of some of the upper exchange-coupling control layer362. The function and constitution of the upper exchange-couplingcontrol layer 362 may be substantially identical to those of the lowerexchange-coupling control layer 344.

A vertical reference magnetic layer 363 may be disposed on the upperexchange-coupling control layer 362. The vertical reference magneticlayer 363 may include a ferromagnetic material. The atoms constitutingthe vertical reference magnetic layer 363 may constitute a crystalstructure having an easily magnetized axis substantially vertical to theplane of the substrate 310. For example, the vertical reference magneticlayer 363 may include a cobalt (Co) and/or platinum (Pt) ordered alloyor disordered alloy, and the c-axis of the HCP lattice may be verticalto the plane of the substrate 310. Accordingly, the vertical anisotropyof the vertical reference magnetic layer 363 may be significantlyenhanced. The vertical reference magnetic layer 363 may further includeat least one selected from the group consisting of boron (B), chromium(Cr), silicon (Si), and/or copper (Cu).

An upper reference magnetic layer 364, 365 may be disposed on the upperexchange-coupling control layer 363. The upper reference magnetic layer364, 365 may include reference non-magnetic layers 364 and referenceferromagnetic layers 365 alternately stacked. The reference non-magneticlayer 364 may include at least one selected from the group consisting ofiron (Fe), cobalt (Co), and/or nickel (Ni), while the referenceferromagnetic layers 365 may include at least one selected from thegroup consisting of chromium (Cr), platinum (Pt), palladium (Pd),iridium (Ir), ruthenium (Ru), rhodium (Rh), osmium (Os), rhenium (Re),gold (Au), and/or copper (Cu). For example, the upper reference magneticlayer 364, 365 may include [Co/Pb]n, [Co/Pt]n, or [Ni/Pt]n (n is anatural number of 2 or more). The stacking numbers of the referencenon-magnetic layers 364 and reference ferromagnetic layers 365 may be ina range of about 2 to about 11 times. The reference ferromagnetic layers365 may be formed with a very thin thickness. For example, the referenceferromagnetic layers 365 may be formed with an atomic layer thickness.The magnetization direction of the reference ferromagnetic layer 365 maybe vertical to the plane of the substrate 310.

The upper reference magnetic layer 364, 365 may be disposed in differentshapes. For example, the upper reference magnetic layer 364, 365 mayinclude a first reference ferromagnetic layer, a reference non-magneticlayer, and a second reference ferromagnetic layer, that is, a syntheticanti-ferromagnet (SAF) layer, which are sequentially stacked on thevertical reference magnetic layer 363.

A capping layer 370 may be disposed on the upper reference magneticlayer 364, 365. The capping layer 370 may include at least one selectedfrom the group consisting of tantalum (Ta), aluminum (Al), copper (Cu),gold (Au), silver (Ag), titanium (Ti), tantalum nitride (TaN), and/ortitanium nitride (TiN).

Referring to FIGS. 7 and 8, a method for forming a magnetic memorydevice according to third embodiments of inventive concepts will bedescribed. Description previously described may be omitted withreference to FIG. 7.

Referring to FIG. 8, a lower electrode 320 is formed on a substrate 310.The lower electrode 320 may include a metal or a metal compound.

A seed layer 330 is formed on the lower electrode 320. The seed layer330 may include metals with a HCP lattice or a FCC lattice. For example,the seed layer 330 may include at least one selected from the groupconsisting of ruthenium (Ru), titanium (Ti), platinum (Pt), palladium(Pd), gold (Au), silver (Ag), copper (Cu), and/or aluminum (Al). Theseed layer 330 may be formed with a relatively thin thickness. Forexample, the seed layer 330 may be formed to have a thickness in a rangeof about 2 Å (Angstroms) to about 20 Å (Angstroms).

A vertical free magnetic layer 342 is formed on the seed layer 330. Thecrystal structure of the vertical free magnetic layer 342 may align withthe crystal structure of the seed layer 330. For example, the verticalfree magnetic layer 342 may be formed with a HCP lattice equal to thecrystal structure of the seed layer 330. The vertical free magneticlayer 342 may include cobalt (Co) and/or platinum (Pt). The verticalfree magnetic layer 342 may include an ordered alloy or a disorderedalloy of the cobalt (Co) and the platinum (Pt).

The vertical free magnetic layer 342 grown by using the seed layer 330as a seed may be formed by a relatively low temperature process. Forexample, the vertical free magnetic layer 342 formed by using the seedlayer 330 as a seed may be deposited at room temperature.

In the case of a magnetic memory device with the magnetization directionof magnetic substances vertical to a substrate, a magnetic substancehaving a crystal structure with a large vertical anisotropy, forexample, a ferromagnetic substance constituted by an L10 ordered alloyis used. In order to form a ferromagnetic substance with the L10 orderedalloy, a plurality of seed layers including a chromium (Cr) seed layerwith a FCC lattice and a platinum (Pt) seed layer with a BCC lattice maybe required. The plurality of layers are formed more thickly than asingle seed layer. Therefore, the size of a device including the seedlayer may be increased. During a patterning process of the seed layer,other magnetic layer and insulation layers may be contaminated byetching by-products of the seed layer. In particular, when a tunnelbarrier to be subsequently described is contaminated by etchingby-products of the seed layer, a shorting phenomenon may occur on thetunnel barrier to degrade the function of a memory. Furthermore, the L10ordered alloy may be formed using a high-temperature deposition processof 400° C. or higher and/or using a high-temperature annealing processof 600° C. or higher.

Conversely, when a vertical free magnetic layer 342 with a HCP latticeis formed according to embodiments of the inventive concept, the seedlayer 330 may be formed as a single layer. Accordingly, the thickness ofthe seed layer 330 may be thinner than those of a plurality of layers.The crystal structure of the vertical free magnetic layer 342 may have ahigh dependence on the seed layer 330. Accordingly, the vertical freemagnetic layer 342 according to embodiments of the inventive concept mayalign with the crystal structure of the seed layer 330 even at a lowprocess temperature. That is, a high-temperature deposition process orhigh-temperature annealing process may not be essential.

A lower exchange-coupling control layer 344 may be formed on thevertical free magnetic layer 342. The lower exchange-coupling controllayer 344 may include a ferromagnetic metal with a largeexchange-coupling constant, for example, at least one selected frommetals including iron (Fe), cobalt (Co), and/or nickel (Ni). Conversely,the lower exchange-coupling control layer 344 may include a non-magneticmaterial which may enhance the surface magnetic anisotropy of anadjacent magnetic substance or control the crystal orientation of amagnetic substance to be formed on the lower exchange-coupling controllayer 344. For example, the lower exchange-coupling control layer 344may include at least one selected from the group consisting of titanium(Ti), chromium (Cr), ruthenium (Ru), rhodium (Ru), copper (Cu),magnesium (Mg), zinc (Zn), aluminum (Al), tantalum (Ta), palladium (Pd),and/or platinum (Pt). In some embodiments, the surface of the lowerexchange-coupling control layer 344 may be oxidized. A process for theoxidation may include an injection of an infinitesimal amount of oxygeninto a chamber where a product in which the vertical free magnetic layer342 has been formed is loaded prior to a formation of the lowerexchange-coupling control layer 344, or an oxidation layer may be formedby injection of an infinitesimal amount of oxygen into the chamber aftera formation of the lower exchange-coupling control layer 344 with anatomic layer thickness and then a formation of the rest lowerexchange-coupling control layer 344.

A junction free magnetic layer 348 may be formed on the lowerexchange-coupling control layer 344. The vertical anisotropy of thejunction free magnetic layer 348 may be enhanced by the vertical freemagnetic layer 342 and/or the lower exchange-coupling control layer 344.Specifically, the crystallization of the junction free magnetic layer348 into the crystal structure of the vertical free magnetic layer 342may be prevented and/or reduced by the crystal structure of the lowerexchange-coupling control layer 344. For example, when the lowerexchange-coupling control layer 344 is omitted, the junction freemagnetic layer 348 formed in an amorphous state may be crystallized intothe crystal structure of the vertical free magnetic layer 342 by aheating process. In this case, the crystal structure of the junctionfree magnetic layer 348 may be aligned by the crystal structure of thevertical free magnetic layer 342, that is, an (011) crystal plane otherthan a (001) crystal plane of a BCC structure, and then themagnetoresistance ratio of a magnetic tunnel junction including thejunction free magnetic layer 348 may be decreased. However, because thevertical free magnetic layer 342 is separated from the junction freemagnetic layer 348 by the lower exchange-coupling control layer 344, thecrystal structure of the junction free magnetic layer 348 may not alignwith the crystal structure of the vertical free magnetic layer 342.Accordingly, the magnetoresistance ratio of a magnetic tunnel junctionmay be enhanced.

Referring again to FIG. 7, a tunnel barrier 350 may be formed on thejunction free magnetic layer 348. The tunnel barrier may include atleast one selected from the group consisting of magnesium (Mg), titanium(Ti), aluminum (Al), an oxide of magnesium-zinc (MgZn) and/ormagnesium-boron (MgB), and/or a nitride of titanium (Ti) and/or vanadium(V). For example, the tunnel barrier 350 may be a magnesium oxide (MgO)layer. Conversely, the tunnel barrier 350 may include a plurality oflayers. For example, the tunnel barrier may include magnesium(Mg)/magnesium oxide (MgO), magnesium oxide (MgO)/magnesium (Mg), and/ormagnesium (Mg)/magnesium oxide (MgO)/magnesium (Mg). The tunnel barrier350 may be formed by deposition of the metal oxide or metal nitride onthe junction free magnetic layer 348 or formation of a metal layer onthe junction free magnetic layer 348, and then oxidation of the metallayer. In an embodiment, the tunnel barrier 350 may have a predeterminedcrystal structure. For example, the tunnel barrier 350 may have aNaCl-type crystal structure (face-centered cubic lattice structure).

A junction reference magnetic layer 361 may be formed on the tunnelbarrier 350. The junction reference magnetic layer 361 may have arelatively low saturation magnetization. The junction reference magneticlayer 361 may include a soft magnetic material. The junction referencemagnetic layer 361 may further include a non-magnetic material. Thejunction reference magnetic layer 361 may have magnetic properties equalto those of the junction free magnetic layer 348. Conversely, thejunction reference magnetic layer 361 may have magnetic propertiesdifferent from those of the junction free magnetic layer 348. Forexample, the product of the thickness of the junction reference magneticlayer 361 and the saturation magnetization of the junction referencemagnetic layer 361 may be larger than that of the thickness of thejunction free magnetic layer 348 and the saturation magnetization of thejunction free magnetic layer 348.

The crystal structure of the junction reference magnetic layer 361 mayalign with the tunnel barrier 350. For example, when the tunnel barrier350 is formed of a magnesium oxide (MgO) having a (001) crystal plane ofa NaCl (face-centered cubic lattice) structure parallel to the plane ofthe substrate 310, the junction reference magnetic layer 361 may alignwith the crystal structure of the tunnel barrier 350. Accordingly, thevertical magnetic anisotropy of the junction reference magnetic layer361 may be enhanced. The crystallization of the junction referencemagnetic layer 361 may be performed by a heating process.

An upper exchange-coupling control layer 362 may be formed on thejunction reference magnetic layer 361. The upper exchange-couplingcontrol layer 362 may include a magnetic material with a largeexchange-coupling constant. Accordingly, an exchange-coupling betweenthe vertical reference magnetic layer 363 and the magnetic junctionreference magnetic layer 361 may be enhanced to increase the verticalmagnetic anisotropy of the junction reference magnetic layer 361. Theupper exchange-coupling control layer 362 may serve as a seed layer andmay be aligned such that an easily magnetized axis of the verticalreference magnetic layer 363 is vertical to the plane of the substrate310. In some embodiments, the surface of the upper exchange-couplingcontrol layer 362 may be oxidized. A process for the oxidation mayinclude an injection of an infinitesimal amount of oxygen into a chamberwhere a product in which the upper junction reference magnetic layer 361has been formed is loaded prior to a formation of the upperexchange-coupling control layer 362, or an oxidation layer may be formedby injection of an infinitesimal amount of oxygen into the chamber aftera formation of the upper exchange-coupling control layer 362 with anatomic layer thickness and then a formation of the rest upperexchange-coupling control layer 362.

A vertical reference magnetic layer 363 may be formed on the junctionreference magnetic layer 361. The vertical reference magnetic layer 363may be an amorphous ferromagnetic layer. For example, the verticalreference magnetic layer 363 may be formed of an amorphous cobalt (Co)and/or platinum (Pt) alloy. The vertical reference magnetic layer 363may include at least one selected from the group consisting of boron(B), chromium (Cr), silicon (Si), and/or copper (Cu).

An upper reference magnetic layer 364, 365 may be formed on the verticalreference magnetic layer 363. Reference non-magnetic layers 364 andreference ferromagnetic layers 365 may be alternately stacked aplurality of times to form the upper reference magnetic layer 364, 365.The reference ferromagnetic layers 365 may be formed with a very thinthickness. For example, the reference ferromagnetic layers 365 may beformed with an atomic layer thickness.

The upper reference magnetic layer 364, 365 may be formed in variousforms. For example, the upper reference magnetic layer 364, 365 mayinclude a first reference ferromagnetic layer, a reference non-magneticlayer, and a second reference ferromagnetic layer, that is, a syntheticanti-ferromagnet (SAF) layer, which are sequentially stacked on thevertical reference magnetic layer 363.

As the vertical reference magnetic layer 363 and/or the upperexchange-coupling control layer 362 are(is) interposed between thereference non-magnetic layer 364 and the junction reference magneticlayer 361, the magnetoresistance ratio of a magnetic tunnel junctionincluding the junction reference magnetic layer 361 may be enhanced.Specifically, when the reference non-magnetic layer 364 is directlyformed on the junction reference magnetic layer 361, a metalconstituting the reference non-magnetic layer 364 may react with amaterial constituting the reference magnetic layer 361 during a heatingprocess to form a layer which does not have magnetic properties. Themagnetoresistance ratio of the magnetic tunnel junction may besignificantly reduced by the layer which does not have magneticproperties.

In some embodiments, the junction reference magnetic layer 361 may bethinly formed with a thickness equal to or smaller than a predeterminedcritical thickness. In this case, the junction reference magnetic layer361 may be consumed by reaction with the reference non-magnetic layer364 to reduce the magnetoresistance ratio. Conversely, because thevertical reference magnetic layer 363 and/or the upper exchange-couplingcontrol layer 364 are(is) formed between the vertical reference magneticlayer 361 and the reference non-magnetic layer 364 according toembodiments of inventive concepts, a layer which does not have magneticproperties may not be formed. Accordingly, the junction referencemagnetic layer 361 is not unnecessarily consumed. Therefore, themagnetoresistance ratio of a magnetic tunnel junction including thejunction reference magnetic layer 361 may be enhanced.

A capping layer 370 may be formed on the upper reference magnetic layer364, 365. The capping layer 370 may include at least one selected fromthe group consisting of tantalum (Ta), aluminum (Al), copper (Cu), gold(Au), silver (Ag), titanium (Ti), tantalum nitride (TaN), and/ortitanium nitride (TiN).

Layers stacked on the substrate 310 may be patterned. The patterning maybe performed after all the layers from the lower electrode 310 to thecapping layer 370 are stacked, or the patterning of some layers may beperformed prior to the stacking of the other layers. The patterning maybe performed using an ion beam process and/or a photolithographyprocess. The patterning may include the performing an anisotropy etchingprocess.

(Fourth Embodiment)

Referring to FIG. 10, a magnetic memory device according to fourthembodiments of inventive concepts will be described. A lower electrode420 is disposed on a substrate 410. The substrate 410 may include aconductive region and/or an insulating region. The lower electrode 420may be electrically connected to the conductive region in the substrate410.

A seed layer 430 is disposed on the lower electrode 420. The seed layer430 may include metal atoms constituting a HCP lattice. The HCP c-axesmay be substantially vertical to the plane of the substrate 410.

A reference magnetic substance 440 may be disposed on the seed layer430. The reference magnetic substance 440 may include a verticalreference magnetic layer 442, a lower exchange-coupling control layer444, and/or a junction reference magnetic layer 448, which aresequentially stacked on the seed layer 430.

The vertical reference magnetic layer 442 may include a ferromagneticmaterial. The vertical reference magnetic layer 442 may have an easilymagnetized axis in a direction vertical to the substrate 410. Forexample, the vertical reference magnetic layer 442 may include ahexagonal close-packing (HCP) lattice. As illustrated in FIG. 9, thehexagonal close-packing (HCP) lattice of the vertical reference magneticlayer 442 may include an a-axis, a b-axis, and a c-axis. The c-axis ofthe HCP lattice constituting the vertical reference magnetic layer 442may be substantially parallel to the c-axis constituting the seed layer430. The c-axis of the HCP lattice constituting the vertical referencemagnetic layer 442 may be substantially vertical to the plane of thesubstrate 410. The easily magnetized axis of the vertical referencemagnetic layer 442 may be the c-axis. Accordingly, the magnetizationdirection of the vertical reference magnetic layer 442 may be verticalto the substrate 410.

In an embodiment, the vertical reference magnetic layer 442 may includea cobalt-platinum (CoPt) disordered alloy having a platinum content in arange of about 10% to about 45% by atomic percent. The platinum atomiccontent in the vertical reference magnetic layer 442 may be in a rangeof about 20% to about 30% by atomic percent. The vertical referencemagnetic layer 442 may further include a non-magnetic material. Forexample, the vertical reference magnetic layer 442 may further includeat least one selected from the group consisting of boron (B), chromium(Cr), and/or copper (Cu).

In another embodiment, the vertical reference magnetic layer 442 mayinclude Co₃Pt which is an ordered alloy. The vertical reference magneticlayer 442 may further include a non-magnetic material. For example, thevertical reference magnetic layer 442 may further include at least oneselected from the group consisting of boron (B), chromium (Cr), silicon(Si), and/or copper (Cu).

In still another embodiment, the vertical reference magnetic layer 442may include a plurality of layers. In this case, the vertical referencemagnetic layer 442 may include a first reference ferromagnetic layerhaving a HCP lattice and a second reference ferromagnetic layer on thefirst reference ferromagnetic layer, which are sequentially stacked onthe seed layer 430. The first reference ferromagnetic layer may be oneselected from various embodiments of the vertical reference magneticlayer 442 as previously described, while the second referenceferromagnetic layer may be an alloy including at least one selected fromthe group consisting of iron (Fe), cobalt (Co), and/or nickel (Ni) andat least one selected from rare earth metals. For example, the rareearth metal may be at least one selected from the group consisting ofterbium (Tb), dysprosium (Dy), and/or gadolinium (Gd). Conversely, thesecond reference ferromagnetic layer may be at least one selected fromferromagnetic materials with a L10 crystal structure including Fe₅₀Pt₅₀,Fe₅₀Pd₅₀, Co₅₀Pt₅₀, Co₅₀Pd₅₀, and/or Fe₅₀Ni₅₀. The vertical referencemagnetic layer 442 may have a high vertical anisotropy by the HCPstructure of the vertical reference magnetic layer 442. Accordingly, theresistance dispersion and switching current properties of a magneticmemory device including the vertical reference magnetic layer 442 may beimproved.

A lower exchange-coupling control layer 444 may be disposed on thevertical reference magnetic layer 442. The lower exchange-couplingcontrol layer 444 may include a magnetic material with a largeexchange-coupling constant or a non-magnetic material which may increasethe surface magnetic anisotropy. For example, the lowerexchange-coupling control layer 444 may include at least one from iron(Fe), cobalt (Co), and/or nickel (Ni), which have a large exchangecoupling constant. The lower exchange-coupling control layer 444 mayfurther include platinum (Pt). The thickness of the lowerexchange-coupling control layer 444 may be in a range of about 2 Å(Angstroms) to about 20 Å (Angstroms). The lower exchange-couplingcontrol layer 444 may reinforce an exchange-coupling between thevertical reference magnetic layer 442 and a junction reference magneticlayer 448 which will be described. Because the vertical referencemagnetic layer 442 has a high vertical anisotropy as previouslydescribed, the junction reference magnetic layer 448 exchange-coupled bythe vertical reference magnetic layer 442 and the lowerexchange-coupling control layer 444 may also have a high verticalanisotropy.

For another example, the lower exchange-coupling control layer 444 mayinclude at least one selected from non-magnetic metals includingtitanium (Ti), chromium (Cr), ruthenium (Ru), rhodium (Rh), copper (Cu),magnesium (Mg), zinc (Zn), aluminum (Al), tantalum (Ta), palladium (Pd),and/or platinum (Pt). The non-magnetic metals may control theorientation of the crystal structures of adjacent magnetic layers. Insome embodiments, the lower exchange-coupling control layer 444 mayfurther include an oxidation layer on the surface of the lowerexchange-coupling control layer 444. The oxidation layer may be a layerwhere the surface of the lower exchange-coupling control layer 444 isoxidized. The surface magnetic anisotropy of the adjacent magneticlayers may be enhanced by the lower exchange-coupling control layer 444.

A tunnel barrier 450 may be formed on the junction reference magneticlayer 448. The tunnel barrier 450 may include at least one selected fromthe group consisting of magnesium (Mg), titanium (Ti), aluminum (Al), anoxide of magnesium-zinc (MgZn) and/or magnesium-boron (MgB), and/or anitride of titanium (Ti) and/or vanadium (V). The tunnel barrier 450 mayinclude a plurality of layers. For example, the tunnel barrier 450 mayinclude magnesium (Mg)/magnesium oxide (MgO), magnesium oxide(MgO)/magnesium (Mg), and/or magnesium (Mg)/magnesium oxide(MgO)/magnesium (Mg).

A free magnetic substance 460 may be disposed on the tunnel barrier 450.The free magnetic substance 460 may include a junction free magneticlayer 461 contacting the tunnel barrier 450, an exchange-couplingcontrol layer 463 on the junction free magnetic layer 461, and an upperfree magnetic layer 466 on the upper exchange-coupling control layer463.

The junction free magnetic layer 461 may include a soft magneticmaterial. The junction free magnetic layer 461 may have a low saturationmagnetization. The junction free magnetic layer 461 may also have a lowdamping constant and a high spin polarization ratio. The junction freemagnetic layer 461 may include at least one selected from the groupconsisting of cobalt (Co), iron (Fe), and/or nickel (Ni). The junctionfree magnetic layer 461 may further include at least one fromnon-magnetic materials including boron (B), zinc (Zn), aluminum (Al),titanium (Ti), ruthenium (Ru), tantalum (Ta), silicon (Si), silver (Ag),gold (Au), copper (Cu), carbon (C), and/or nitrogen (N).

For example, the junction free magnetic layer 461 may include CoFeand/or NiFe, and may further include boron (B). Furthermore, thejunction free magnetic layer 461 may further include at least oneselected from non-magnetic elements including titanium (Ti), aluminum(Al), silicon (Si), magnesium (Mg), and/or tantalum (Ta). The content ofthe selected non-magnetic element in the junction free magnetic layer461 may be in a range of about 1% to about 15% by atomic percent.

An upper exchange-coupling control layer 463 may be disposed on thejunction free magnetic layer 461. The upper exchange-coupling controllayer 463 may include a material with a large exchange-couplingconstant, for example, a ferromagnetic material, or a material which mayincrease the orientation and vertical anisotropy of an adjacent magneticsubstance, for example, a non-magnetic metal. For example, the upperexchange-coupling control layer 463 may include at least one selectedfrom the group consisting of iron (Fe), cobalt (Co), and/or nickel (Ni).For another example, the upper exchange-coupling control layer 463 mayinclude at least one selected from the group consisting of titanium(Ti), chromium (Cr), ruthenium (Ru), copper (Cu), magnesium (Mg), zinc(Zn), aluminum (Al), tantalum (Ta), palladium (Pd), and/or platinum(Pt). In some embodiments, the upper exchange-coupling control layer 463may further include an oxidation layer contacting the upperexchange-coupling control layer 463. The oxidation layer may be an oxideof some of the upper exchange-coupling control layer 463.

The upper free magnetic layer 466 may include a single magnetic layer ora plurality of magnetic layers. For example, the upper free magneticlayer 466 may include a first free ferromagnetic layer, a freenon-magnetic layer, and a second free ferromagnetic layer, that is, asynthetic anti-ferromagnet (SAF) layer, which are sequentially stackedon the upper exchange-coupling control layer 463. The upper freemagnetic layer 466 may include magnetic layers having a changeablemagnetization direction in various shapes.

A capping layer 470 is disposed on the upper free magnetic layer 466.The capping layer may include at least one selected from the groupconsisting of tantalum (Ta), aluminum (Al), copper (Cu), gold (Au),silver (Ag), titanium (Ti), tantalum nitride (TaN), and/or titaniumnitride (TiN).

Referring to FIG. 10, a method for forming a magnetic memory deviceaccording to fourth embodiments of inventive concepts will be described.Further discussion of previously described elements may be omitted forthe sake of conciseness.

Referring again to FIG. 10, a lower electrode 420 and a seed layer 430are formed on a substrate 410. The seed layer 430 may include metalswith a HCP lattice or a FCC lattice. For example, the seed layer 430 mayinclude at least one selected from the group consisting of ruthenium(Ru), titanium (Ti), platinum (Pt), palladium (Pd), gold (Au), silver(Ag), copper (Cu), and/or aluminum (Al). The seed layer 430 may beformed with a relatively thin thickness. For example, the seed layer 430may be formed to have a thickness in a range of about 10 Å (Angstroms)to about 100 Å (Angstroms).

A vertical reference magnetic layer 442 is formed on the seed layer 430.The vertical reference magnetic layer 442 may include a material whichhas a large dependence on the seed layer 430. For example, the crystalstructure of the vertical reference magnetic layer 442 may align withthe crystal structure of the seed layer 430. For example, the verticalreference magnetic layer 442 may be grown along the c-axis of the seedlayer 430. Accordingly, the vertical reference magnetic layer 442 grownby using the seed layer 430 as a seed may be formed through a relativelylow temperature process.

For example, the vertical reference magnetic layer 442 may includecobalt (Co) and/or platinum (Pt). The vertical reference magnetic layer442 may include an ordered alloy or a disordered alloy according to thecobalt (Co) and platinum (Pt) contents. For example, the verticalreference magnetic layer 442 formed using the seed layer 330 as a seedmay be deposited at room temperature.

A lower exchange-coupling control layer 444 may be formed on thevertical magnetic layer 442. The lower exchange-coupling control layer444 may include a ferromagnetic metal with a large exchange-couplingconstant, for example, at least one selected from metals including iron(Fe), cobalt (Co), and/or nickel (Ni). Conversely, the lowerexchange-coupling control layer 444 may increase the surface magneticanisotropy of an adjacent magnetic substance. For example, the lowerexchange-coupling control layer 444 may include a non-magnetic material,for example, a non-magnetic metal element or a transition metal. Thelower exchange-coupling control layer 444 may include at least oneselected from the group consisting of titanium (Ti), chromium (Cr),ruthenium (Ru), rhodium (Rh), copper (Cu), magnesium (Mg), zinc (Zn),aluminum (Al), tantalum (Ta), palladium (Pd), and/or platinum (Pt).

In some embodiments, the surface of the lower exchange-coupling controllayer 444 may be oxidized. A process for the oxidation may include aninjection of an infinitesimal amount of oxygen into a chamber where aproduct in which the vertical magnetic layer 442 has been formed isloaded prior to a formation of the lower exchange-coupling control layer444, or a formation of an oxidation layer by injection of aninfinitesimal amount of oxygen into the chamber after a formation of thelower exchange-coupling control layer 444 with an atomic layer thicknessand then a formation of the rest lower exchange-coupling control layer444.

A junction reference magnetic layer 448 may be formed on the lowerexchange-coupling control layer 444. The vertical anisotropy of thejunction reference magnetic layer 448 may be enhanced by the verticalreference magnetic layer 442 and/or the lower exchange-coupling controllayer 444.

A tunnel barrier 450 is formed on the junction reference magnetic layer448. The tunnel barrier 450 may include at least one selected from thegroup consisting of magnesium (Mg), titanium (Ti), aluminum (Al), anoxide of magnesium-zinc (MgZn) and/or magnesium-boron (MgB), and/or anitride of titanium (Ti) and/or vanadium (V). Conversely, the tunnelbarrier 450 may include a plurality of layers. For example, the tunnelbarrier 450 may include magnesium (Mg)/magnesium oxide (MgO), magnesiumoxide (MgO)/magnesium (Mg), and/or magnesium (Mg)/magnesium oxide(MgO)/magnesium (Mg). In an embodiment, the tunnel barrier 450 may havea NaCl-type structure (body-centered cubic lattice structure). Forexample, the tunnel barrier 450 may include magnesium oxide (MgO).

A junction free magnetic layer 461 is formed on the tunnel barrier 450.The junction free magnetic layer 461 may have a relatively lowsaturation magnetization. The junction free magnetic layer 461 mayfurther include a non-magnetic material. The junction free magneticlayer 461 may be formed in an amorphous state.

An upper exchange-coupling control layer 463 may be formed on thejunction free magnetic layer 461. In an embodiment, the junction freemagnetic layer 461 may include a magnetic material with a largeexchange-coupling constant. Accordingly, as the exchange couplingbetween the junction free magnetic layer 461 and an upper referencemagnetic layer 466 to be subsequently described increases, the verticalanisotropy of the junction free magnetic layer 461 may be increased.Specifically, when the upper exchange coupling control layer is formedon the junction free magnetic layer 461, the crystal structure of thejunction free magnetic layer 461 may not be crystallized into thecrystal structure of upper free magnetic layer 466 to be subsequentlydescribed, but may align with the crystal structure of the tunnelbarrier 450. As the junction free magnetic layer 461 aligns with thecrystal structure of the tunnel barrier 450, the magnetoresistance ratioof a magnetic tunnel junction including the junction free magnetic layer461 may be enhanced. In an embodiment, the interface between the upperexchange-coupling control layer 463 and the junction free magnetic layer461 may be oxidized. A process for the oxidation may be performed by aninjection of an infinitesimal amount of oxygen into a chamber where thesubstrate 410 on which the upper junction free magnetic layer 461 hasbeen formed is loaded after a formation of the upper junction freemagnetic layer 461, or a formation of an oxide by injection of aninfinitesimal amount of oxygen into the chamber after a formation of theexchange-coupling control layer 463 with an atomic layer thickness andthen a formation of the rest exchange-coupling control layer 463.

An upper free magnetic layer 466 may be formed on the upperexchange-coupling control layer 463. The upper free magnetic layer 466may include a single layer including a ferromagnetic material or aplurality of layers including the single layer. In an embodiment, theupper free magnetic layer 466 may include a ferromagneticlayer-antiferromagnetic layer-ferromagnetic layer structure.

A capping layer 470 may be formed on the upper exchange-coupling controllayer 463. The capping layer 470 may include at least one selected fromthe group consisting of tantalum (Ta), aluminum (Al), copper (Cu), gold(Au), silver (Ag), titanium (Ti), tantalum nitride (TaN), and/ortitanium nitride (TiN).

According to some embodiments of the inventive concept, as anon-magnetic layer is intervened between a vertical magnetic layer and ajunction magnetic layer, a magnetoresistance ratio and a verticalmagnetization property of a magnetic tunnel junction including thejunction magnetic layer can improve. In addition, during operation ofthe magnetic memory device, switching properties can improve through afree magnetic layer and a reference magnetic layer which haverespectively different contents of iron. Accordingly, reliability of themagnetic memory device can improve.

According to other embodiments of the inventive concept, a magneticlayer can have a hexagonal close packing (HCP) lattice having an axiswhich is vertical to the plane of the substrate 100 and easilymagnetized. Accordingly, directions of spins of electrons can be arrayedto a perpendicular direction with respect to the substrate. Therefore, amagnetoresistance ratio of a magnetic tunnel junction can improve. Inaddition, switching current of the magnetic memory device including amagnetic tunnel junction can be decreased.

The above-disclosed subject matter is to be considered illustrative andnot restrictive, and the appended claims are intended to cover all suchmodifications, enhancements, and other embodiments, which fall withinthe true spirit and scope of inventive concepts disclosed herein. Thus,to the maximum extent allowed by law, the scope of the inventiveconcepts is to be determined by the broadest permissible interpretationof the following claims and their equivalents, and shall not berestricted or limited by the foregoing detailed description.

What is claimed is:
 1. A magnetic memory device comprising: a firstvertical magnetic layer; a non-magnetic layer on the first verticalmagnetic layer; a first junction magnetic layer on the non-magneticlayer wherein the non-magnetic layer is between the first verticalmagnetic layer and the first junction magnetic layer; a tunnel barrieron the first junction magnetic layer wherein the first junction magneticlayer is between the non-magnetic layer and the tunnel barrier; a secondjunction magnetic layer on the tunnel barrier wherein the tunnel barrieris between the first and second junction magnetic layers; and a secondvertical magnetic layer on the second junction magnetic layer whereinthe second junction magnetic layer is between the tunnel barrier and thesecond vertical magnetic layer, wherein the first junction magneticlayer directly contacts with the tunnel barrier, and the first junctionmagnetic layer is exchange coupled with the first vertical magneticlayer by the non-magnetic layer.
 2. The magnetic memory device of toclaim 1 wherein magnetization directions of the first and secondvertical magnetic layers are perpendicular with respect to a plane ofthe tunnel barrier.
 3. The magnetic memory device of claim 1 wherein thenon-magnetic layer is a first non-magnetic layer, the device furthercomprising: a second non-magnetic layer between the second junctionmagnetic layer and the second vertical magnetic layer.
 4. The magneticmemory device of claim 1 wherein the first junction magnetic layerand/or the second junction magnetic layer comprise a first crystalstructure, and wherein the first vertical magnetic layer and/or thesecond vertical magnetic layer comprise a second crystal structuredifferent than the first crystal structure.
 5. The magnetic memorydevice of claim 4 wherein a crystal plane of the tunnel barrier at aninterface between the tunnel barrier and the first junction magneticlayer and a crystal plane of the first junction magnetic layer at theinterface between the tunnel barrier and the first junction magneticlayer are the same.
 6. The magnetic memory device of claim 5 wherein thefirst crystal structure is a body-centered cubic (BCC) crystalstructure, and the crystal plane is a (001) crystal plane.
 7. Themagnetic memory device of claim 4 wherein the second crystal structureis an L10 crystal structure or a hexagonal closed-packing lattice. 8.The magnetic memory device of claim 1 wherein the first verticalmagnetic layer and/or the second vertical magnetic layer comprisenon-magnetic metal layers and ferromagnetic metal layers alternatelystacked multiple times, and the ferromagnetic metal layers comprise athickness of one to several atoms.
 9. The magnetic memory device ofclaim 1 wherein the first junction magnetic layer and/or the secondjunction magnetic layer comprise at least one selected from the groupconsisting of cobalt (Co), iron (Fe), and/or nickel, and a non-magneticelement.
 10. The magnetic memory device of claim 1 wherein the firstvertical magnetic layer and/or the second vertical magnetic layercomprise an RE-TM alloy.
 11. The magnetic memory device of claim 1wherein the non-magnetic layer has a thickness in a range of about 2 Å(Angstroms) to about 20 Å (Angstroms).
 12. The magnetic memory device ofclaim 1 wherein the non-magnetic layer comprises a non-magnetic metal.13. The magnetic memory device of claim 1 wherein the non-magnetic layercomprises a non-magnetic transition metal.
 14. The magnetic memorydevice of claim 1 wherein the first vertical magnetic layer and thefirst junction magnetic layer are exchange-coupled through thenon-magnetic layer.
 15. The magnetic memory device of claim 1 whereinthe non-magnetic layer includes a metal compound layer comprising atleast one selected from the group consisting of a metal oxide, a metalnitride, and/or a metal oxynitride.
 16. A magnetic memory devicecomprising: a substrate; a first magnetic substance on the substratecomprising a vertical magnetic layer having a hexagonal close-packing(HCP) lattice structure adjacent the substrate wherein the verticalmagnetic layer comprises Co₃Pt; a tunnel barrier on the first magneticsubstance wherein the first magnetic substance is between the substrateand the tunnel barrier; and a second magnetic substance on the tunnelbarrier wherein the tunnel barrier is between the first and secondmagnetic substances.
 17. The magnetic memory device of claim 16 whereina c-axis of the HCP lattice is substantially perpendicular with respectto a plane of the substrate.
 18. The magnetic memory device of claim 17wherein the c-axis is an axis at which the vertical magnetic layer iseasily magnetized.
 19. The magnetic memory device of claim 16 furthercomprising: a seed layer having an HCP lattice structure, wherein theseed layer is between the substrate and the vertical magnetic layer. 20.A magnetic memory device comprising: a substrate; a first magneticsubstance on the substrate comprising a vertical magnetic layer having ahexagonal close-packing (HCP) lattice structure adjacent the substratewherein the vertical magnetic layer is a first vertical magnetic layer;a tunnel barrier on the first magnetic substance wherein the firstmagnetic substance is between the substrate and the tunnel barrier; anda second magnetic substance on the tunnel barrier wherein the tunnelbarrier is between the first and second magnetic substances, wherein thesecond magnetic substance comprises a second vertical magnetic layerhaving an HCP lattice structure.
 21. The magnetic memory device of claim20 wherein the first magnetic substance includes a first magneticjunction layer adjacent the tunnel barrier, wherein the first magneticjunction layer is between the first vertical magnetic layer and thetunnel barrier, wherein the second magnetic substance includes a secondmagnetic junction layer adjacent the tunnel barrier, and wherein thesecond magnetic junction layer is between the tunnel barrier and thesecond vertical magnetic layer.
 22. The magnetic memory device of claim21 wherein each of the first and second magnetic junction layerscomprises a soft magnetic material.
 23. The magnetic memory device ofclaim 21 further comprising: an exchange coupling control layer betweenthe first vertical magnetic layer and the first magnetic junction layerand/or between the second vertical magnetic layer and the secondmagnetic junction layer.
 24. The magnetic memory device of claim 23wherein a crystal structure of the exchange coupling control layer isaligned with a crystal structure of the first magnetic junction layerand/or with a crystal structure of the second magnetic junction layer.25. The magnetic memory device of claim 21 wherein the second magneticsubstance includes non-magnetic layers and ferromagnetic layersalternately stacked multiple times on the second vertical magneticlayer.
 26. The magnetic memory device of claim 16 wherein the firstvertical magnetic layer includes a disordered cobalt-platinum alloyhaving a platinum content in a range of 10% to 45% by atomic percent.27. The magnetic memory device of claim 20 wherein the first verticalmagnetic layer comprises Co₃Pt.
 28. The magnetic memory device of claim16 wherein the first vertical magnetic layer further comprises at leastone selected from the group consisting of boron (B), chromium (Cr),and/or copper (Cu).
 29. The magnetic memory device of claim 16 whereinthe tunnel barrier comprises at least one selected from the groupconsisting of magnesium (Mg), titanium (Ti), aluminum (Al), an oxide ofmagnesium-zinc (MgZn) and/or magnesium-boron (MgB), and/or a nitride oftitanium (Ti) and/or vanadium.
 30. The magnetic memory device of claim16 further comprising: a capping layer on the second magnetic substancewherein the capping layer comprises at least one selected from the groupconsisting of tantalum (Ta), aluminum (Al), copper (Cu), gold (Au),silver (Ag), titanium (Ti), tantalum nitride (TaN), and/or titaniumnitride (TiN).
 31. The magnetic memory device of claim 16 whereincurrent flows in a direction substantially perpendicular with respect toa plane of the substrate during operation of the magnetic memory device.32. The magnetic memory device of claim 16 wherein a magnetizationdirection of the first magnetic layer and/or a magnetization directionof the second magnetic layer is substantially perpendicular with respectto a plane of the substrate.
 33. The magnetic memory device of claim 1wherein the second junction magnetic layer contacts with the tunnelbarrier.
 34. The magnetic memory device of claim 33 wherein thenon-magnetic layer is a first non-magnetic layer, the device furthercomprising: a second non-magnetic layer between the second junctionmagnetic layer and the second vertical magnetic layer, wherein thesecond non-magnetic layer contacts with the second junction magneticlayer.
 35. The magnetic memory device of claim 1 wherein the firstjunction magnetic layer contacts with the non-magnetic layer.
 36. Themagnetic memory device of claim 1 wherein each of the first and secondmagnetic junction layers comprises a soft magnetic material.
 37. Themagnetic memory device of claim 1 wherein the non-magnetic layer isconfigured to enhance a vertical magnetic anisotropy of the magneticmemory device.
 38. The magnetic memory device of claim 1 wherein thefirst junction magnetic layer comprises a first crystal structure andthe first vertical magnetic layer comprises a second crystal structuredifferent than the first crystal structure, and/or wherein the secondjunction magnetic layer comprises the first crystal structure and thesecond vertical magnetic layer comprises the second crystal structure.